61
Ralph Kurt, Levinus Pieter Bakker: Filter window manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 17, 2010: US07776390

A filter window manufacturing method includes fabricating a structure of wires on a substrate, depositing a lacquer over the wires and the substrate, depositing a first layer that includes a material selected from the group consisting of AlN, Ru, Ir, Au, SiN, Rh, C and combinations thereof, removing ...


62
Levinus Pieter Bakker, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen: Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 6, 2010: US07692169

A method for filtering particles out of a beam of radiation propagating from a radiation source is provided. The method includes passing the beam of radiation through a filter having a first portion within the beam of radiation and a second portion outside of the beam of radiation, capturing at leas ...


63
Levinus Pieter Bakker: Optical element, lithographic apparatus including such optical element and device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, November 27, 2012: US08318288

An optical element includes a top layer which is transmissive for EUV radiation with wavelength λ in the range of 5-20 nm, and a structure of the top layer is a structure having an rms roughness value equal to or larger than λ/10 for spatial periods equal to or smaller than λ/2. The structure promot ...


64
Levinus Pieter Bakker, Martinus Bernardus Van Der Mark: Device and method for acquiring image data from a turbid medium. Koninklijke Philips Electronics, January 15, 2013: US08355131

A device and method of acquiring image data from a turbid medium using a diffuse optical tomography device including irradiating the turbid medium at a plurality of first spatial positions, collecting light emanating from the turbid medium at a plurality of second spatial positions, splitting the li ...


65
Vadim Yevgenyevich Banine, Levinus Pieter Bakker, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Yurii Victorvitch Sidelnikov, Marcel Mathijs Theodore Marie Dierichs, Marius Ravensbergen: Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, September 21, 2010: US07800079

An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radia ...


66
Levinus Pieter Bakker: Lithographic apparatus, device manufacturing method, and optical component. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 20, 2010: US07701554

An optical component for use in a lithographic apparatus. The optical component includes an optical element having an optical surface for reflecting electromagnetic radiation, and a protective zone covering the optical surface. The protective zone is provided with a material that substantially prote ...


67
Vadim Yevgenyevich Banine, Levinus Pieter Bakker, Ralph Kurt, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Peter Cornelis Zalm: System and method for detecting at least one contamination species in a lithographic apparatus. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, May 21, 2013: US08445873

A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least ...


68
Joost Jeroen Ottens, Levinus Pieter Bakker, Wilhelmus Josephus Box, Jan Van Elp, Frank Jeroen Pieter Schuurmans, Jan Evert Van Der Werf: Device manufacturing method, lithographic apparatus and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 8, 2009: US07630060

A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer targe ...


69
Sjoerd Stallinga, Levinus Pieter Bakker: Method and apparatus for generating radically and/or azimuthally polarized light beams. Koninklijke Philips Electronics, May 11, 2010: US07715100

A method and an apparatus for generating a polarized light beam to be projected onto an object plane are provided. A converging or diverging light beam (18) is generated. The converging or diverging light beam is projected through a member (22, 52) comprising an uniaxial birefringent material, the u ...


70
Thomas Koehler, Tim Nielsen, Bernhard Brendel, Andy Ziegler, Ronny Ziegler, Levinus Pieter Bakker, Martinus Bernardus Van Der Mark: Device for imaging the interior of an optically turbid medium and receptacle unit for such a device. KONINKLIJKE PHILIPS, November 8, 2016: US09488574

A device (1) for imaging the interior of an optically turbid medium is provided. The device comprises a receptacle (3; 103) structured to accommodate an optically turbid medium for examination and an optically matching medium filling a space between an inner surface (6; 106) of the receptacle (3; 10 ...