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Johannes Catharinus Hubertus Mulkens, Paul Van Der Veen, Willem Van Schaik, Vadim Yevgenyevich Banine, Levinus Pieter Bakker, Johannes Hubertus Josephina Moors, Heine Melle Mulder: Lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, March 24, 2009: US07508487 (3 worldwide citation)

In a lithographic projection system, the radiation energy delivered to the substrate needs to be accurately controlled. Attenuation by injecting an absorbent gas into a volume through which the radiation passes is a convenient way to control the energy. Additionally, the interaction between gasses a ...


32
Arnoud Cornelis Wassink, Levinus Pieter Bakker, Johannes Hubertus Josephina Moors, Frank Jeroen Pieter Schuurmans: Lithographic apparatus, illumination system, filter system and method for cooling a support of such a filter system. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, February 3, 2009: US07485881 (3 worldwide citation)

A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of fo ...


33
Levinus Pieter Bakker, Marcel Mathijs Theodore Marie Dierichs, Johannes Maria Freriks, Frank Jeroen Pieter Schuurmans, Jakob Vijfvinkel, Wilhelmus Josephus Box: Contamination barrier with expandable lamellas. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, June 15, 2010: US07737425 (3 worldwide citation)

A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction f ...


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Maarten Marinus Johannes Wilhelmus Van Herpen, Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder: Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 27, 2010: US07706057 (3 worldwide citation)

A multi-layer mirror includes a multi-layer stack. The multi-layer stack includes a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack. The spectral filter top layer includes a first spectral purity enhancement layer t ...


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Maarten Marinus Johannes Wilhelmus Van Herpen, Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder: Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 9, 2008: US07463413 (3 worldwide citation)

A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first sp ...


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Jeroen Jonkers, Levinus Pieter Bakker, Frank Jeroen Pieter Schuurmans: Method and device for removing particles generated by means of a radiation source during generation of short-wave radiation. Koninklijke Philips Electronics, May 8, 2012: US08173975 (3 worldwide citation)

A method for removing contaminant particles, such as atoms, molecules, clusters, ions, and the like, produced by a radiation source during generation of short-wave radiation having a wavelength of up to approximately 20 nm, includes guiding a first gas between the radiation source and a particle tra ...


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Vadim Yevgenyevich Banine, Levinus Pieter Bakker, Ralph Kurt, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Peter Cornelis Zalm: System and method for detecting at least one contamination species in a lithographic apparatus. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, March 1, 2011: US07897110 (3 worldwide citation)

A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least ...


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Levinus Pieter Bakker, Jeroen Jonkers, Antonius Johannes Josephus Van Dijsseldonk, Marcel Mathijs Theodore Marie Dierichs: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 17, 2006: US06987275 (3 worldwide citation)

A controlled aperture provides an opening through a barrier separating two parts of the apparatus to enable a pulse of radiation to be radiated from one part of the apparatus to the a second part. The controlled aperture closes the opening between the pulses of radiation to minimize the gas flow bet ...


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Ralph Kurt, Levinus Pieter Bakker, Frank Jeroen Pieter Schuurmans: Lithographic projection apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop, September 14, 2004: US06791665 (3 worldwide citation)

A lithographic projection apparatus is provided wherein an object situated in a pulsed beam of radiation has an electrode in its vicinity and a voltage source connected either to the electrode or to the object. This configuration can provide a negative voltage pulse to the object relative to the ele ...


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Levinus Pieter Bakker, Jeroen Jonkers, Frank Jeroen Pieter Schuurmans, Hugo Matthieu Visser: Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 14, 2010: US07852460 (2 worldwide citation)

A lithographic projection apparatus includes a reflector assembly, the reflector assembly includes a first and a second reflector extending in a direction of an optical axis, the first and second reflector each having a reflective surface, a backing surface and an entry section at respectively a fir ...