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Maarten Marinus Johannes W Van Herpen, Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder: Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, February 26, 2008: US07336416 (5 worldwide citation)

A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first sp ...


22
Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Vladimir Mihailovitch Krivtsun: Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, June 13, 2006: US07061574 (5 worldwide citation)

A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a ...


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Levinus Pieter Bakker, Frank Jeroen Pieter Schuurmans: Lithographic projection apparatus with multiple suppression meshes. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, June 14, 2005: US06906788 (5 worldwide citation)

A lithographic projection apparatus is disclosed. The apparatus includes a radiation system to transmit a beam of radiation emitted from a radiation source, and a support structure constructed to hold a patterning structure to be irradiated by the beam. A substrate holder is constructed to hold a su ...


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Levinus Pieter Bakker, Marcel Mathijs Theodore Marie Dierichs, Johannes Maria Freriks, Frank Jeroen Pieter Schuurmans, Jakob Vijfvinkel, Wilhelmus Josephus Box: Radiation system with contamination barrier. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 6, 2012: US08129702 (4 worldwide citation)

A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiatio ...


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Derk Jan Wilfred Klunder, Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Frank Jeroen Pieter Schuurmans, Dominik Vaudrevange, Maarten Marinus Johannes Wilhelmus Van Herpen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 23, 2008: US07468521 (4 worldwide citation)

A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant ...


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Maarten Marinus Johannes Wilhelmus Van Herpen, Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder: Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 20, 2012: US08139200 (4 worldwide citation)

A lithographic apparatus comprising a support configured to support a patterning device; a substrate table configured to hold a substrate; a projection system configured to project a pattern imparted to a radiation beam by the patterning device onto a target portion of the substrate; and a first mul ...


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Levinus Pieter Bakker, Frank Jeroen Pieter Schuurmans: Mirror for use in a lithographic apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 22, 2009: US07592610 (4 worldwide citation)

A top layer of a predetermined metal is provided on a mirror for use in a lithographic apparatus having source to provide radiation of a desired wavelength. The source generates a stream of undesired metal particles that are deposited to form smaller and larger nuclei on the mirror. The top layer ma ...


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Jan Van Elp, Martinus Hendrikus Antonius Leenders, Vadim Yevgenyevich Banine, Hugo Matthieu Visser, Levinus Pieter Bakker: Lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 16, 2005: US06930760 (4 worldwide citation)

In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectr ...


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Levinus Pieter Bakker: Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 29, 2008: US07405804 (4 worldwide citation)

A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substr ...


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Levinus Pieter Bakker, Frank Jeroen Pieter Schuurmans: Method for the protection of an optical element, lithographic apparatus, and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 1, 2007: US07211810 (4 worldwide citation)

A method for the protection of an optical element of a lithographic apparatus including the optical element and a source of radiation includes providing a material including one or more elements selected from B, C, Si, Ge and/or Sn, and arranging the material such that the source, in use, causes rem ...