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Levinus Pieter Bakker, Frank Jeroen Pieter Schuurmans, Vadim Yevgenyevich Banine: Lithographic projection apparatus and particle barrier for use therein. ASML Netherlands, Pillsbury Winthrop, January 4, 2005: US06838684 (44 worldwide citation)

A lithographic projection apparatus for EUV lithography includes a foil trap. The foil trap forms an open structure after the EUV source to let the EUV radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to t ...


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Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Cornelis Petrus Andreas Maria Luijkx, Frank Jeroen Pieter Schuurmans: Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 11, 2007: US07307263 (35 worldwide citation)

A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patter ...


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Michael Cornelis Van Beek, Frank Jeroen Pieter Schuurmans, Levinus Pieter Bakker: Optical analysis system using multivariate optical elements. Koninklijke Philips Electronics, March 2, 2010: US07671973 (34 worldwide citation)

The present invention provides an optical analysis system for determining an amplitude of a principal component of an optical signal. The principal component is indicative of the concentration of a particular compound or various compounds of a substance that is subject to spectroscopic analysis. The ...


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Levinus Pieter Bakker, Frank Jeroen Pieter Schuurmans, Vadim Yevgenyevich Banine: Lithographic projection apparatus, particle barrier for use therein, integrated structure manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, June 6, 2006: US07057190 (27 worldwide citation)

A lithographic projection apparatus for EUV lithography includes a foil trap, or channel barrier. The foil trap forms an open structure after the source to let the radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse tra ...


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Frank Jeroen Pieter Schuurmans, Michael Cornelis Van Beek, Levinus Pieter Bakker, Wouter Harry Jacinth Rensen, Bernardus Hendrikus Wilhelmus Hendriks, Robert Frans Maria Hendriks, Thomas Steffen: Optical analysis system. Koninklijke Philiips Electronics, July 29, 2008: US07405825 (20 worldwide citation)

The optical analysis system (20) for determining an amplitude of a principal component of an optical signal comprises a multivariate optical element (10) for reflecting the optical signal and thereby weighing the optical signal by a spectral weighing function, and a detector (9, 9P, 9N) for detectin ...


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Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Ralph Kurt, Frank Jeroen Pieter Schuurmans, Yurii Victorovitch Sidelnikov: Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 25, 2006: US07034308 (19 worldwide citation)

A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the ...


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Levinus Pieter Bakker, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen: Lithographic apparatus, illumination system and debris trapping system. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 5, 2006: US07145132 (16 worldwide citation)

A debris trapping system for trapping debris particles released with the generation of radiation by a radiation source in a lithographic apparatus includes first and second sets of channels. Each channel of the first set enables radiation from a radiating source to propagate therethrough and has an ...


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Levinus Pieter Bakker, Ralph Kurt, Bastiaan Matthias Mertens, Markus Weiss, Johann Trenkler, Wolfgang Singer: Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system. ASML Netherlands, Carl Zeiss SMT, Pillsbury Winthrop Shaw Pittman, October 3, 2006: US07116394 (16 worldwide citation)

A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles near the surface of the component ...