1
Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser: Imaging apparatus. ASML Netherlands, Pillsbury Winthrop, August 17, 2004: US06778257 (424 worldwide citation)

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub ...


2
Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser: Imaging apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 4, 2006: US07023525 (5 worldwide citation)

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub ...


3
Lev Sakin: Ignition system incorporating ultraviolet light. Reising Ethington Barnard Perry & Milton, August 24, 1993: US05237969 (3 worldwide citation)

An ignition system (20) for an internal combustion engine (10) includes a spark plug assembly (21) having an optical passage (45) therethrough that allows an ultraviolet light beam (62) from a source (24) to enter the combustion chamber (8) and be directed to a gap (60) between two electrodes (36) a ...


4
Robert D Harned, Lev Sakin, Patrick de Jager, Cheng Qun Gui, Irina Pozhinskaya, Noreen Harned: Large field of view 2X magnification projection optical system for FPD manufacture. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, July 29, 2008: US07405802 (1 worldwide citation)

An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage and a substrate stage. A magnification reflective optical system images the reticle onto the substrate. The system may be a 2× magnification system, or another magnification that is compatible with currently ava ...


5
Lev Ryzhikov, Yuli Vladimirsky, Lev Sakin: System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions. ASML Holdings, Sterne Kessler Goldstein & Fox PLLC, July 10, 2007: US07242456 (1 worldwide citation)

A lithography system has a magnification module having multiple magnifications at a same time within an object plane, which can include a pattern generator therein. The pattern generator is used to pattern light from an illumination system, which is directed by a projection optical system onto a sub ...


6
Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser: Imaging apparatus. Asml Netherlands, Pillsbury Winthrop, February 13, 2003: US20030030781-A1 (1 worldwide citation)

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub ...


7
Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser: Imaging apparatus. ASML Netherlands, Pillsbury Winthrop, December 2, 2004: US20040239909-A1

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub ...


8
Stanislav Smirnov, Mark L Oskotsky, Lev Sakin, John D Martin: Method, system, and computer program product for determining refractive index distribution. ASML US, Sterne Kessler Goldstein & Fox Pllc, December 19, 2002: US20020191193-A1

The present invention provides a method and system for determining three-dimensional refractive gradient index distribution. The method and system of the present invention determine inhomogeneity data and calculate index of refraction changes in three-dimensions (3D). The method and system provide 3 ...


9
Lev Ryzhikov, Yuli Vladimirsky, Lev Sakin: System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions. ASML Holding, Sterne Kessler Goldstein & Fox Pllc, December 1, 2005: US20050264782-A1

A lithography system has a magnification module having multiple magnifications at a same time within an object plane, which can include a pattern generator therein. The pattern generator is used to pattern light from an illumination system, which is directed by a projection optical system onto a sub ...


10
Robert D Harned, Lev Sakin, Patrick de Jager, Cheng Qun Gui, Irina Pozhinskaya, Noreen Harned: Large field of view 2X magnification projection optical system for FPD manufacture. ASML Holding, Sterne Kessler Goldstein & Fox Pllc, October 27, 2005: US20050237505-A1

An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage and a substrate stage. A magnification ringfield reflective optical system images the reticle onto the substrate. The system may be a 2× magnification system, or another magnification that is compatible with cur ...