1
Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser: Imaging apparatus. ASML Netherlands, Pillsbury Winthrop, August 17, 2004: US06778257 (424 worldwide citation)

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub ...


2
Jeffrey M Hoffman, Joseph M Kunick, Mark Oskotsky, Lev Ryzhikov: Zoom illumination system for use in photolithography. Silicon Valley Group, Sterne Kessler Goldstein & Fox P L L C, October 23, 2001: US06307682 (16 worldwide citation)

The present invention provides an illumination system for varying the size of an illumination field incident to a scattering optical element. The illumination field is subsequently imaged to a reticle in a photolithographic process. The illumination system includes, in series along an optical axis o ...


3
Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Walter Augustyn: Advanced illumination system for use in microlithography. Sterne Kessler Goldstein & Fox PLLC, November 2, 2004: US06813003 (10 worldwide citation)

A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a ...


4
Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Peter J Baumgartner, Walter Augustyn: Advanced illumination system for use in microlithography. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, August 10, 2004: US06775069 (9 worldwide citation)

The present invention relates to an illumination system including an illumination source, a beam conditioner placed in an optical path with the illumination source, a first diffractive array, a condenser system and a second diffractive array. The illumination source directs light through the beam co ...


5
Lev Ryzhikov: Microscope objective with ball lens and protection plate. Nikon Corporation, Norman R Klivans, Skjerven Morrill MacPherson Franklin & Friel, April 27, 1999: US05898524 (7 worldwide citation)

An objective lens system with protection glass for a microscope and having a numerical aperture of 1.25 and using an immersion oil, having a first, second, third and fourth lens groups, the first lens group being a plano-parallel plate cemented to a hemispherical lens, the second lens group being on ...


6
Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Walter Augustyn: Advanced illumination system for use in microlithography. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, March 6, 2007: US07187430 (5 worldwide citation)

A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a ...


7
Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser: Imaging apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 4, 2006: US07023525 (5 worldwide citation)

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub ...


8
Arno Jan Bleeker, Johannes Jacobus Matheus Baselmans, Marce Mathijs Theodore Marie Dierichs, Stanislav Smirnov, Christian Wagner, Lev Ryzhikov, Kars Zeger Troost: Lithographic apparatus and device manufacturing method. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, December 28, 2010: US07859647 (4 worldwide citation)

A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radia ...


9
Lev Ryzhikov, Abel Joobeur, Yevgeniy Konstantinovich Shmarev: Optical integrators for lithography systems and methods. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, December 8, 2009: US07630136 (3 worldwide citation)

An optical integrator having a first surface and a second surface that is used in a lithographic apparatus to modify light. The first surface is reflective, defines a volume, and is configured to be disposed in an optical illumination system along an optical axis, to surround the optical axis, and t ...


10
Lev Ryzhikov: Microscope objective lens with separated lens groups. Nikon Corporation, Michael J Halbert, Skjerven Morrill MacPherson Franklin & Friel, March 23, 1999: US05886827 (3 worldwide citation)

An objective lens system having a first and a second lens group that are separated by a gap where a ray bundle between the first and second lens is substantially telecentric and the second lens group has two lens elements that are also separated by a gap. The first lens element in the second lens gr ...