1
Mark A Hollis, Daniel J Ehrlich, R Allen Murphy, Bernard B Kosicki, Dennis D Rathman, Chang Lee Chen, Richard H Mathews, Barry E Burke, Mitch D Eggers, Michael E Hogan, Rajender Singh Varma: Optical and electrical methods and apparatus for molecule detection. Massachusetts Institute of Technology, Houston Advanced Research Center, Baylor College of Medicine, Hamilton Brook Smith & Reynolds P C, August 5, 1997: US05653939 (399 worldwide citation)

A method and apparatus are disclosed for identifying molecular structures within a sample substance using a monolithic array of test sites formed on a substrate upon which the sample substance is applied. Each test site includes probes formed therein to bond with a predetermined target molecular str ...


2
Lee Chen, Caiz Hong Tian, Naoki Matsumoto: Surface wave plasma processing system and method of using. Tokyo Electron, Oblon Spivak McClelland Maier & Neustadt P C, November 21, 2006: US07138767 (152 worldwide citation)

A SWP source includes an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. A power coupling system is coupled to the EM wave launcher and configured to ...


3
Lee Chen, Jianping Zhao, Ronald V Bravenec, Merritt Funk: Stable surface wave plasma source. Tokyo Electron, Wood Herron & Evans, April 9, 2013: US08415884 (145 worldwide citation)

A surface wave plasma (SWP) source is described. The SWP source comprises an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. The EM wave launcher comp ...


4
Lee Chen, John Chiong, Dennis Oshiba: System and method to apply a packet routing policy to an application session. A10 Networks, Carr & Ferrell, November 12, 2013: US08584199 (98 worldwide citation)

A security gateway includes packet routing policies, each including a host network address, an application network address, and a forwarding interface. In routing data packets of an application session, the security gateway: recognizes the application session between a network and an application; de ...


5
Lee Chen, Charles J Hendricks, Gangadhara S Mathad, Stanley J Poloncic: Single wafer plasma etch reactor. International Business Machines Corporation, Douglas A Lashmit, August 13, 1985: US04534816 (77 worldwide citation)

A high pressure, high etch rate single wafer plasma reactor having a fluid cooled upper electrode including a plurality of small diameter holes or passages therethrough to provide uniform reactive gas distribution over the surface of a wafer to be etched. A fluid cooled lower electrode is spaced fro ...


6
Peter Federlin, Lee Chen, D Rex Wright: Tri-polar electrostatic chuck. Hewlett Packard Co, International Business Machines, Sematech, William W Kidd, November 5, 1996: US05572398 (75 worldwide citation)

A tri-polar electrostatic chuck has both positive and negative electrodes housed on a non-polarized base housing. A non-polarized guard ring surrounds the outer periphery of the chuck and enclosing the electrodes. A wafer is placed atop the chuck with its back-side cooled by a cooling gas that is pi ...


7
Lee Chen, Henri A Khoury, Harlan R Seymour: Optical emission spectroscopy end point detection in plasma etching. International Business Machines Corporation, Joseph F Villella, J Jancin Jr, John A Jordan, January 15, 1985: US04493745 (73 worldwide citation)

A method for etching a batch of semiconductor wafers to end point using optical emission spectroscopy is described. The method is applicable to any form of dry plasma etching which produces an emission species capable of being monitored. In a preferred embodiment, as well as a first alternative embo ...


8
Lee Chen, John R Lankard, Gangadhara S Mathad: Laser induced chemical etching of metals with excimer lasers. International Business Machines Corporation, T Rao Coca, December 25, 1984: US04490211 (55 worldwide citation)

Disclosed is a method of etching a metallized substrate by excimer laser radiation. The substrate is exposed to a selected gas, e.g., a halogen gas, which spontaneously reacts with the metal forming a solid reaction product layer on the metal by a partial consumption of the metal. A beam of radiatio ...


9
Lee Chen, Tung J Chuang, Gangadhara S Mathad: Laser induced dry etching of vias in glass with non-contact masking. International Business Machines Corporation, T Rao Coca, October 23, 1984: US04478677 (52 worldwide citation)

Disclosed is an apparatus and method for etching a glass substrate by laser induced dry etching. The apparatus features a housing including a vacuum chamber for receiving the substrate; a vacuum pump coupled to the chamber for evacuating the chamber; a gas source coupled to the chamber for supplying ...


10
Lee Chen, Gangadhara S Mathad: Method for control of etch profile. International Business Machines Corporation, Douglas A Lashmit, June 9, 1987: US04671849 (52 worldwide citation)

A method for precisely controlling the profile of an opening etched in a layer of material, for example, an insulating layer. In one embodiment, wherein a silicon dioxide layer is reactive ion etched through a photoresist mask, the concentration of a reactive species in an etchant gas is changed dur ...