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Pawloski Adam R, Ado Amr Y, Amblard Gilles R, Lafontaine Bruno M, Lalovic Ivan, Levinson Harry J, Schefske Jeffrey A, Tabery Cyrus E, Tsai Frank: Immersion medium bubble elimination in immersion lithography. Advanced Micro Devices, Pawloski Adam R, Ado Amr Y, Amblard Gilles R, Lafontaine Bruno M, Lalovic Ivan, Levinson Harry J, Schefske Jeffrey A, Tabery Cyrus E, Tsai Frank, sCOLLOPY Daniel R, March 10, 2005: WO/2005/022266 (345 worldwide citation)

A method of operating an immersion lithography system (26), including steps of immersing at least a portion of a wafer (12) to be exposed in an immersion medium (24), wherein the immersion medium comprises at least one bubble (28); directing an ultrasonic wave (36) through at least a portion of the ...


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Ershov Alexander I, Partlo William N, Brown Daniel Jw, Fomenkov Igor V, Bergstedt Robert A, Sandstrom Richard L, Lalovic Ivan: Laser system. Cymer, Ershov Alexander I, Partlo William N, Brown Daniel Jw, Fomenkov Igor V, Bergstedt Robert A, Sandstrom Richard L, Lalovic Ivan, CRAY William C, May 10, 2007: WO/2007/053335 (4 worldwide citation)

A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine las ...


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Spangler Ronald L, Lipcon Jacob P, Rule John A, Jacques Robert N, Kroyan Armen, Lalovic Ivan, Fomenkov Igor V, Algots John M: Laser spectral engineering for lithographic process. Cymer, April 28, 2004: EP1412182-A2

An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographi ...


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Kroyan Armen, Lalovic Ivan, Fomenkov Igor, Das Palash P, Sandstrom Richard L, Algots John M, Ahmed Khurshid: Laser spectral engineering for lithographic process. Cymer, February 4, 2004: EP1386376-A1

An integrated circuit lithograohy technique (pectral engineering) for bandwidth control of an electric discharge laser. A computer models lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism (104) adjusts th ...


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Ershov Alexander I, Partlo William N, Brown Daniel J W, Fomenkov Igor V, Bergstedt Robert A, Sandstrom Richard L, Lalovic Ivan: Laser system. Cymer, August 6, 2008: EP1952493-A2

A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine las ...


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Spangler Ronald L, Lipcon Jacob P, Rule John A, Jacques Robert N, Kroyan Armen, Lalovic Ivan, Fomenkov Igor V, Algots John M: Laser spectral engineering for lithographic process. Cymer, Spangler Ronald L, Lipcon Jacob P, Rule John A, Jacques Robert N, Kroyan Armen, Lalovic Ivan, Fomenkov Igor V, Algots John M, ROSS John R, February 13, 2003: WO/2003/011595

An integrated circuit lithography technique called (spectral engineering for bandwidth control of an electric discharge laser. A computer models lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism (104) adj ...


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Kroyan Armen, Lalovic Ivan, Fomenkov Igor, Das Palash P, Sandstrom Richard L, Algots John M, Ahmed Khurshid: Laser spectral engineering for lithographic process. Cymer, Kroyan Armen, Lalovic Ivan, Fomenkov Igor, Das Palash P, Sandstrom Richard L, Algots John M, Ahmed Khurshid, ROSS John R, November 21, 2002: WO/2002/093700

An integrated circuit lithograohy technique (pectral engineering) for bandwidth control of an electric discharge laser. A computer models lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism (104) adjusts th ...


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Kroyan Armen, Lalovic Ivan, Fomenkov Igor V, Das Palash P, Sandstrom Richard L: Laser spectral engineering for lithographic process. Cymer, July 11, 2003: TW541607

An integrated circuit lithography technique called spectral engineering by Applicant, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic ...



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