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Lyons Christopher F, Babcock Carl P, Kye Jongwook: Immersion lithographic process using a conforming immersion medium. Advanced Micro Devices, Lyons Christopher F, Babcock Carl P, Kye Jongwook, DRAKE Paul S, July 7, 2005: WO/2005/062128 (346 worldwide citation)

A method of making a device using a lithographic system (10) having a lens (32) from which an exposure pattern (24) is emitted. A conforming immersion medium (26) can be positioned between a photo resist layer (34) and the lens. The photo resist layer, which can be disposed over a wafer, and the len ...


2
Minvielle Anna M, Tabery Cyrus E, Kim Hung Eil, Kye Jongwook: System and method for fabricating contact holes. Advanced Micro Devices, Minvielle Anna M, Tabery Cyrus E, Kim Hung Eil, Kye Jongwook, sDRAKE Paul S, November 3, 2005: WO/2005/103828 (3 worldwide citation)

A method of forming a plurality of contact holes (20, 24) of varying pitch and density in a contact layer (56) of an integrated circuit device (10) is provided . The plurality of contact holes (20, 24) can include a plurality of regularly spaced contact holes (20) having a first pitch along a first ...


3
Kye Jongwook, Babcock Carl P, Lyons Christopher F: Pellicle for a lithographic lens. Advanced Micro Devices, Kye Jongwook, Babcock Carl P, Lyons Christopher F, DRAKE Paul S, September 15, 2005: WO/2005/085956 (2 worldwide citation)

Disclosed are a method and apparatus for preventing contamination in a lithographic apparatus (10) including a projection system (24). The lithographic apparatus (10) images an irradiated portion of a mask (22) onto a target portion (40) of a substrate (28). A pellicle (32, 36) is placed with respec ...


4
Lafontaine Bruno, Kye Jongwook, Levinson Harry: Phase-shift-moire focus monitor. Advanced Micro Devices, October 27, 2004: GB2400922-A

An optical monitor (108) includes a body (110) having a first plurality of parallel, substantially opaque, spaced apart lines (112) thereon, and the second plurality of parallel, substantially opaque, spaced apart lines (122) thereon, with a relatively small angle between the first and second plural ...


5
Lyons Christopher F, Babcock Carl P, Kye Jongwook: Immersion lithographic process using a conforming immersion medium. Advanced Micro Devices, August 23, 2006: GB2423374-A

A method of making a device using a lithographic system (10) having a lens (32) from which an exposure pattern (24) is emitted. A conforming immersion medium (26) can be positioned between a photo resist layer (34) and the lens. The photo resist layer, which can be disposed over a wafer, and the len ...


6
Minivielle Anna M, Tabery Cyrus E, Kim Hung Eil, Kye Jongwook: System and method for fabricating contact holes. Advanced Micro Devices, January 17, 2007: GB2428109-A

A method of forming a plurality of contact holes (20, 24) of varying pitch and density in a contact layer (56) of an integrated circuit device (10) is provided. The plurality of contact holes (20, 24) can include a plurality of regularly spaced contact holes (20) having a first pitch along a first d ...


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Kye Jongwook, Levinson Harry: Test structures for electrical linewidth measurement and processes for their formation. Advanced Micro Devices, RODDY Richard J, February 6, 2003: WO/2003/010797

In a method of determining a linewidth of a polysilicon line (16) formed by a lithographic process, a polysilicon layer is formed on a substrate. A line (16) is patterned from said polysilicon layer using said lithographic process and a Van der Pauw structure (14) is patterned from said polysilicon ...


10
Lafontaine Bruno, Kye Jongwook, Levinson Harry: Phase-shift-moire focus monitor. Advanced Micro Devices, sRODDY Richard J, March 13, 2003: WO/2003/021360

An optical monitor (108) includes a body (110) having a first plurality of parallel, substantially opaque, spaced apart lines (112) thereon, and the second plurality of parallel, substantially opaque, spaced apart lines (122) thereon, with a relatively small angle between the first and second plural ...



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