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Kwan Yim Bun Patrick: Lithographic apparatus, calibration method thereof and device manufacturing method. Asm Lithography, February 27, 2002: EP1182509-A2 (42 worldwide citation)

The X, Y and Rx positions of a mask stage (MT) are measured using optical encoder-reading heads (10,11) measuring displacements of respective grid gratings (12,13) mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be co-planar with t ...


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Kwan Yim Bun Patrick Dr, Van de Pasch Engelbertus Anton, Ariens Andreas Bernardus Gerar, Munnig Schmidt Robert Han, Hoogkamp Jan Frederik, Buis Edwin Johan: Lithographic projection apparatus with collision preventing device. Asm Lithography, June 27, 2001: EP1111471-A2 (34 worldwide citation)

In a multi-table lithographic apparatus in which substrate tables (WTa,WTb) may be exchanged between a first working zone where substrates (Wa,Wb) are loaded onto and removed from the table and a second working zones where wafers are exposed, collision prevention means are provided to prevent collis ...


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Kwan Yim Bun Patrick: Lithography projection apparatus. Asm Lithography, May 24, 2002: JP2002-151405 (26 worldwide citation)

PROBLEM TO BE SOLVED: To provide a lithography projection apparatus including an irradiating device for supplying a radiation projection beam, a support structure for supporting a pattern application means for applying a pattern to the projection beam according to a desired pattern, a substrate tabl ...


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Loopstra Erik Roelof, Schrijver Raymond Laurentius J, Van Empel Tjarko Adriaan Rudol, Baggen Marcel Koenraad, Luttikhuis Bernardus Antonius, Kwan Yim Bun Patrick: Lithographic projection apparatus with purge gas system and method using the same. Asm Lithography, May 9, 2001: EP1098225-A2 (14 worldwide citation)

A lithographic apparatus has at least one compartment closely surrounding at least one of the mask and substrate holders but not either of the illumination or projection systems so as to reduce the volume that must be purged with gas transparent to the projection radiation. In a scanner, the compart ...


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Buis Edwin Johan, Gilissen Noud Jan, Kwan Yim Bun Patrick, Schapendonk Paulus Hendricus C: Cooling of oscillating linear motors in lithographic projection apparatus. Asm Lithography, August 16, 2001: EP1124160-A2 (12 worldwide citation)

A voice coil motor (100) used in a positioning means associated with either a first object table or a second object table in which the coil (3) is cooled with a cooling jacket (4) in thermal contact with the coil, the cooling jacket comprising at least one channel for circulation of a cooling fluid, ...


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Loopstra Erik Roelof, Kwan Yim Bun Patrick, Muitjens Marcel Johannus Elisa, de Vrieze Voorn Sonja Theodora: Lithographic projection apparatus having a temperature controlled heat shield. Asm Lithography, August 16, 2001: EP1124161-A2 (11 worldwide citation)

In a lithographic projection apparatus a first part (30) is shielded from a second part (220) by a heat shield (300). The first part is required to have a temperature of a predetermined value and the second part has a characteristic that may influence the temperature of the first part. The character ...


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Kwan Yim Bun Patrick, Van de Wiel Wilhelmus Theodoru: Lithographic apparatus with a balanced positioning system. Asm Lithography, June 27, 2001: EP1111469-A2 (11 worldwide citation)

A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translations and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. Reac ...


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Kwan Yim Bun Patrick: Lithographic apparatus with a balanced positioning system. Asm Lithography, June 27, 2001: EP1111470-A2 (10 worldwide citation)

A balanced positioning system for use in lithographic apparatus comprises a pair of balance masses (20,30) which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven bod ...


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Schrijver Raymond Laurentius J, Van Empel Tjarko Adriaan Rudolf, Baggen Marcel Koenraad M, Luttikhuis Bernardus Antonius Johannes, Kwan Yim Bun Patrick, Loopstra Erik Roelof: Cleaning gas system in lithography projection system. Asm Lithography, August 3, 2001: JP2001-210587 (10 worldwide citation)

PROBLEM TO BE SOLVED: To provide a cleaning gas system for reducing supplying volume for cleaning gas, in a lithography projection system.SOLUTION: A lithography projection system surrounds at least either of a masking holder or a base plate holder closely and comprises at least one of partitions, w ...