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Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital&apos evitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine: Lithographic projection apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, September 2, 2003: US06614505 (39 worldwide citation)

Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge g ...


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Givi Georgievitch Zukavishvili, Vladimir Vital Evitch Ivanov, Konstantin Nikolaevitch Koshelev, Evgenil Dmitreevitch Korob, Vadim Yevgenyevich Banine, Pavel Stanislavovich Antsiferov: Radiation source, lithographic apparatus, and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 23, 2005: US06933510 (7 worldwide citation)

A radiation source unit is provided that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a space between said anode and cathode and to form a plasma so as to generate electromagnetic radiation. The substance may comprise xenon, indium, lithium ...


3
Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine, Vladimir Vital Evitch Ivanov, Erik René Kieft, Erik Roelof Loopstra, Lucas Henricus Johannes Stevens, Yurii Victorovitch Sidelkov, Vsevolod Grigorevitch Koloshnikov, Vladimir Mihailovitch Krivtsun, Robert Rafilevitch Gayazov, Olav Waldemar Vladimir Frijns: Radiation source, lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 5, 2009: US07528395 (6 worldwide citation)

A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. T ...


4
Vladimir Vitalevitch Ivanov, Vadim Yevgenyevich Banine, Konstantin Nikolaevitch Koshelev: Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, November 14, 2006: US07135692 (5 worldwide citation)

A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-sectio ...


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Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Vladimir Mihailovitch Krivtsun: Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, June 13, 2006: US07061574 (5 worldwide citation)

A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a ...


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Konstantin Nikolaevitch Koshelev, Vladimir Vitalevitch Ivanov, Evgenii Dmitreevitch Korob, Givi Georgievitch Zukavishvili, Robert Rafilevitch Gayazov, Vladimir Mihailovitch Krivtsum: Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 24, 2007: US07208746 (4 worldwide citation)

A device for generating radiation source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or anode may ...


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Konstantin Nikolaevitch Koshelev, Frederik Bijkerk, Givi Georgievitch Zukavishvili, Evgenii Dmitreevitch Korop, Vladimir Vital&apos evitch Ivanov: Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, November 16, 2004: US06818912 (4 worldwide citation)

A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an a ...


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Konstantin Nikolaevitch Koshelev, Frederik Bijkerk, Givi Georgievitch Zukavishvili, Evgenii Dmitreevitch Korop, Vladimir Vital&apos evitch Ivanov: Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, December 23, 2003: US06667484 (3 worldwide citation)

A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an a ...


10
Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Derk Jan Wilfred Klunder: Radiation system and lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 13, 2010: US07696493 (2 worldwide citation)

The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that ...