1
Koen Jacobus Johannes Maria Zaal, Jeroen Joost Ottens: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 19, 2010: US07649611 (22 worldwide citation)

A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a su ...


2
Joost Jeroen Ottens, Noud Jan Gilissen, Martinus Hendrikus Antonius Leenders, Koen Jacobus Johannes Maria Zaal: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 12, 2008: US07411657 (18 worldwide citation)

A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds th ...


3
Koen Jacobus Johannes Maria Zaal, Tjarko Adriaan Rudolf Van Empel, Joost Jeroen Ottens: Lithographic apparatus, substrate holder and method of manufacturing. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 19, 2006: US07110085 (13 worldwide citation)

A lithographic projection apparatus including a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder having a plurality of ...


4
Koen Jacobus Johannes Maria Zaal, Jeroen Johannes Sophia Maria Mertens, Joost Jeroen Ottens: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, June 5, 2007: US07227619 (12 worldwide citation)

A burl plate for use in immersion lithography has a higher burl density in a peripheral portion than in a medial portion so that when a higher pressure differential is applied in the peripheral portion the compression of the burls in the peripheral portion is substantially the same as in the medial ...


5
Marc Wilhelmus Maria Van Der Wijst, Engelbertus Antonius Fransiscus Van Der Pasch, Koen Jacobus Johannes Maria Zaal: Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, March 8, 2011: US07903866 (11 worldwide citation)

An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to ...


6
Joost Jeroen Ottens, Hendrik Antony Johannes Neerhof, Koen Jacobus Johannes Maria Zaal, Marco Le Kluse: Electrostatic clamp assembly for a lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 6, 2007: US07187433 (9 worldwide citation)

An electrostatic clamp assembly for a lithographic apparatus is provided. The clamp assembly includes an electrostatic clamp structured to clamp an article against an article support structure during projection of a beam of radiation, and a controller structured to control at least one of the clamp ...


7
Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens, Jan Hopman: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, February 5, 2008: US07327439 (7 worldwide citation)

A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to condition a radiation beam, and an article support configured to support an article to be placed in a beam path of the radiation beam. The article support includes a plurality of bonded layers. At least ...


8
Henrikus Herman Marie Cox, Koen Jacobus Johannes Maria Zaal: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, February 5, 2008: US07327437 (6 worldwide citation)

A lithographic apparatus includes an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate ...


9
Joost Jeroen Ottens, Hendrik Anthony Johannes Neerhof, Koen Jacobus Johannes Maria Zaal, Marco Le Kluse: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop, May 24, 2005: US06897945 (6 worldwide citation)

A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, a backfill gas feed arranged in the article support for feeding backfill gas to a ...


10
Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, June 3, 2014: US08743339 (5 worldwide citation)

A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a su ...