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Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 4, 2005: US06952253 (374 worldwide citation)

In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.


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Herman Vogel, Klaus Simon, Antonius Theodorus Anna Maria Derksen: Immersion photolithography system and method using microchannel nozzles. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, March 15, 2005: US06867844 (238 worldwide citation)

A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection opti ...


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Joeri Lof, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Theodorus Marinus Modderman: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 25, 2006: US07081943 (141 worldwide citation)

In an immersion lithography apparatus, a member surrounds a space between a projection system and a substrate table. A seal is formed to contain liquid in the space.


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Joeri Lof, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Hendricus Johannes Maria Meijer, Erik Roelof Loopstra: Lithographic apparatus and device manufacturing method with substrate measurement not through liquid. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 20, 2007: US07193232 (140 worldwide citation)

A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, ...


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Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen: Lithographic projection apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, June 17, 2008: US07388648 (106 worldwide citation)

A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table. The liquid confinement structure is positioned adjacent a final surface of the projection system and includes a firs ...


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Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Helmar Van Santen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 22, 2009: US07593093 (62 worldwide citation)

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or ot ...


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Johannes Catharinus Hubertus Mulkens, Antonius Theodorus Anna Maria Derksen, Joeri Lof, Klaus Simon, Alexander Straaijer, Bob Streefkerk: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 2, 2006: US07038760 (62 worldwide citation)

The pressure and/or height of liquid in a liquid reservoir of an immersion lithography apparatus is obtained by a measurement device. The pressure and/or height can be used to determine the height and/or tilt of the substrate.