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Kawauchi Ikuo, Kimura Takeshi: Positive photosensitive composition for use with an infrared laser. Fuji Photo Film, March 17, 1999: EP0901902-A2 (57 worldwide citation)

A positive photosensitive composition for use with an infrared laser comprises one or more alkali aqueous solution soluble polymer compounds (A) having in a molecule at least one group selected from a phenolic hydroxide group (a-1), a sulfonamide group (a-2), and an active imide group (a-3); a compo ...


2
Hamano Satoru, Imai Takeshi, Kimura Takeshi, Goto Shiro: Method of making a rotary electric machine especially suitable for use as a starter for automotive vehicle engines. Nippondenso, Cushman Darby & Cushman, April 15, 1975: US3877142 (32 worldwide citation)

A rotary electric machine especially suitable for use as a starter for automotive vehicle engines having a yoke, a plurality of pole cores and a plurality of field coils corresponding to the number of poles. The inner and/or outer surface of the yoke and the field coil mounting surface of the pole c ...


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Kimura Takeshi: Battery pack. Kenwood, November 2, 2001: JP2001-307703 (25 worldwide citation)

PROBLEM TO BE SOLVED: To increases strength of a battery.SOLUTION: A battery pack is formed by welding or bonding the first case 10a and the second case 10b that are structured by using, for example, a synthetic resin, to store a battery case 20 where a battery member has been enclosed. By bonding a ...


4
Ogawa Kazuyuki, Kimura Takeshi, Shimomura Tetsuo, Nakamori Masahiko, Yamada Takatoshi: Manufacturing method for polishing pad, polishing pad and manufacturing method for semiconductor device. Toyo Tire &Amp Rubber, Toyobo, July 8, 2004: JP2004-188716 (20 worldwide citation)

PROBLEM TO BE SOLVED: To provide a method for manufacturing a polyurethane foam for a polishing pad by adding a surfactant to one of components for forming polyurethane by two-pack type reaction under mechanical stirring to prepare a cellular dispersion and mixing the remaining reaction component to ...


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Takabayashi Kazuhiko, Haraoka Kazuo, Kimura Takeshi, Yamagishi Yasuaki, Gonno Yoshihisa, Nishio Fumihiko: Receiving device and method. Sony, Information Broadcasting Lab I, February 28, 2001: EP1079623-A1 (19 worldwide citation)

Contents is segmented on a unit basis of a meaningful structure, meta-information regarding segment data is added to each segment data, and the contents is distributed. The meta-information is attribute information of the segment data and constructed by positioning and time-dependent arrangement of ...


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Matsumoto Shinji, Kimura Takeshi, Naitou Motohira: Lane deviation preventing device. Nissan Motor, November 6, 2001: JP2001-310719 (17 worldwide citation)

PROBLEM TO BE SOLVED: To provide a lane deviation preventing device capable of preventing lane departure in a good response, improving running safety in a lane deviation state, and improving cognitivity to a driver.SOLUTION: This lane deviation preventing device comprises a deviation discriminating ...


8
Ueno Mikihiro, Kimura Takeshi: Recommendation order selection device, recommendation order selection program recommendation order selection device and recommendation order selection program. Nippon Hoso Kyokai &Lt Nhk&Gt, November 9, 2006: JP2006-309660 (16 worldwide citation)

PROBLEM TO BE SOLVED: To provide a recommendation order selection device and a recommendation order selection program, for selecting recommendation order of a content with high accuracy on the basis of relation between a user and an opposite party.SOLUTION: This recommendation order selection device ...


9
Shimomura Tetsuo, Nakamori Masahiko, Yamada Takatoshi, Kimura Takeshi, Ogawa Kazuyuki: Semiconductor wafer polishing pad and polishing method for the semiconductor wafer. Toyobo, Toyo Tire &Amp Rubber, July 31, 2003: JP2003-218074 (14 worldwide citation)

PROBLEM TO BE SOLVED: To provide a polishing pad that has a fine pattern formed on a semiconductor wafer, is used for a polishing process for planarizing fine irregularities in the pattern, especially contains independent bubbles, and has a high polishing rate in polishing.SOLUTION: In the semicondu ...


10
Shimomura Tetsuo, Nakamori Masahiko, Yamada Takatoshi, Ogawa Kazuyuki, Kazuno Atsushi, Kimura Takeshi: Method for manufacturing polishing pad and the polishing pad. Toyobo, Toyo Tire &Amp Rubber, July 8, 2004: JP2004-193390 (14 worldwide citation)

PROBLEM TO BE SOLVED: To provide a method to manufacture easily and stably a polishing pad that has a small polishing characteristic change over aging and can stabilize polishing even at the beginning of use, the polishing pad that is obtained by the manufacturing method, and a method for manufactur ...