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Yasuyuki Sakakibara, Yasuaki Tanaka, Seiro Murakami, Kenji Nishi: Exposure method and apparatus. Nikon Corporation, Shapiro and Shapiro, September 5, 1995: US05448332 (326 worldwide citation)

An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the ...


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Kenji Nishi: Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement. Nikon Corporation, Shapiro & Shapiro, July 8, 1997: US05646413 (250 worldwide citation)

There is disclosed an exposure method for transferring, using an optical system for illuminating a mask having patterns to be transferred on a substrate and a projection optical system for projecting images of the patterns to the substrate, the patterns to the substrate through the projection optica ...


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Kenji Nishi: Projection exposure apparatus having an off-axis alignment system and method of alignment therefor. Nikon Corporation, Shapiro and Shapiro, September 7, 1993: US05243195 (242 worldwide citation)

An exposure apparatus for exposing mask patterns on a sensitive plate comprises a set (for X and Y direction) of a laser interferometer for measuring a position of a wafer stage and satisfying Abbe's condition with respect to a projection lens and a set (for X and Y direction) of the laser interfero ...


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Kenji Nishi: Exposure method and projection exposure apparatus. Nikon Corporation, Shapiro and Shapiro, March 16, 1993: US05194893 (176 worldwide citation)

A projection exposure apparatus carries out scan exposure with illumination flux of slit(s) by moving a mask and a substrate in a direction of one-dimension at synchronized speeds with each other. The mask is inclined with a predetermined angle relative to the substrate in the direction of one-dimen ...


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Kenji Nishi: Method and apparatus for the alignment of a substrate. Nikon Corporation, Shapiro and Shapiro, February 20, 1996: US05493403 (136 worldwide citation)

Method comprises a process for obtaining a photoelectric signal with a waveform have a pair of extremal values at respective positions corresponding to a pair of edge portions of an alignment mark by photoelectrically detecting the reflected light from the alignment mark on a substrate; a first dete ...


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Yasuaki Tanaka, Seiro Murakami, Kenji Nishi: Exposure method and apparatus. Nikon Corporation, Miles & Stockbridge P C, August 19, 2003: US06608681 (123 worldwide citation)

An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the ...