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Shunpei Yamazaki, Kenji Itoh, Shigenori Hayashi: Method for fabricating with ultrasonic vibration a carbon coating. Semiconductor Energy Laboratory, Eric J Robinson, Sixbey Friedman Leedom & Ferguson PC, August 3, 1999: US05932302 (73 worldwide citation)

In a process for fabricating a carbon coating, an object such as a magnetic recording medium is disposed on a side of an electrode connected to a high-frequency power supply. Ultrasonic vibrations are supplied to the object. Discharge is generated between the electrode connected to the high-frequenc ...


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Shunpei Yamazaki, Kenji Itoh: Method of plasma etching amorphous carbon films. Semiconductor Energy Laboratory, Sixbey Friedman Leedom & Ferguson, December 4, 1990: US04975144 (69 worldwide citation)

An etching method for selectively eliminating carbon material deposited on a substrate is described. A layer of masking material may be applied over areas of the carbon coating whose removal is not desired. After disposing the substrate coated with the carbon material in a CVD reaction chamber, NF.s ...


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Shunpei Yamazaki, Kenji Itoh, Shigenori Hayashi: Hard carbon coating for magnetic recording medium. Semiconductor Energy Laboratory, Eric J Robinson, Nixon Peabody, January 9, 2001: US06171674 (66 worldwide citation)

In an apparatus for fabricating a carbon coating, an object such as a magnetic recording medium is disposed on a side of an electrode connected to a high-frequency power supply. Ultrasonic vibrations are supplied to the object. Discharge is generated between the electrode connected to the high-frequ ...


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Shunpei Yamazaki, Kenji Itoh, Shigenori Hayashi: Method of fabricating the coating. Semiconductor Energy Laboratory, Eric J Robinson, Nixon Peabody, February 6, 2001: US06183816 (66 worldwide citation)

In an apparatus for fabricating a carbon coating, an object such as a magnetic recording medium is disposed on a side of an electrode connected to a high-frequency power supply. Ultrasonic vibrations are supplied to the object. Discharge is generated between the electrode connected to the high-frequ ...


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Shunpei Yamazaki, Kenji Itoh, Shigenori Hayashi: Apparatus for fabricating coating and method of fabricating the coating. Semiconductor Energy Laboratory, Eric J Robinson, Nixon Peabody, October 22, 2002: US06468617 (61 worldwide citation)

In an apparatus for fabricating a carbon coating, an object such as a magnetic recording medium is disposed on a side of an electrode connected to a high-frequency power supply. Ultrasonic vibrations are supplied to the object. Discharge is generated between the electrode connected to the high-frequ ...


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Shunpei Yamazaki, Kenji Itoh, Shigenori Hayashi: Apparatus for fabricating coating and method of fabricating the coating. Semiconductor Energy Laboratory, Eric J Robinson, Robinson Intellectual Property Law Office P C, December 28, 2004: US06835523 (59 worldwide citation)

In an apparatus for fabricating a carbon coating, an object such as a magnetic r cording medium is disposed on a side of an electrode connected to a high-frequency power supply. Ultrasonic vibrations are supplied to the object. Discharge is generated between the electrode connected to the high-frequ ...


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Kenji Itoh: Method of depositing thin films consisting mainly of carbon. Semiconductor Energy Laboratory, Sixbey Friedman Leedom & Ferguson, February 26, 1991: US04996079 (59 worldwide citation)

While CVD (chemical vopour reaction) methods and enhanced CVD methods for coating a substrate with a carbon coating have recently been attracting considerable interest, there have occurred hitherto rubbing-off of the carbon coating from the underlying substrate due to differential thermal expansion ...


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Kenji Itoh: Apparatus and method for forming film. Semiconductor Energy Laboratory, Gerald J Ferguson Jr, Jeffrey L Costellia, Sixbey Friedman Leedom & Ferguson P C, March 9, 1999: US05879741 (57 worldwide citation)

When a thin film is formed on a flexible and filmy substrate by a vapor phase method, the substrate is prevented from warping to be caused by the internal stress remaining in the thin film. When the thin film is formed by the vapor phase method, the substrate is previously curved so that the stress ...


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Kenji Itoh: Apparatus and method for forming film. Semiconductor Energy Laboratory, Jeffrey L Costellia, Nixon Peabody, July 17, 2001: US06261634 (51 worldwide citation)

When a thin film is formed on a flexible and filmy substrate by a vapor phase method, the substrate is prevented from warping to be caused by the internal stress remaining in the thin film. When the thin film is formed by the vapor phase method, the substrate is previously curved so that the stress ...