1
Mario Garza, Nicholas K Eib, John V Jensen, Keith K Chao: Performing optical proximity correction with the aid of design rule checkers. LSI Logic Corporation, Hickman Beyer & Weaver, January 6, 1998: US05705301 (264 worldwide citation)

A method is disclosed for identifying regions of an integrated circuit layout design where optical proximity correction will be most useful and then performing optical proximity correction on those regions only. More specifically, the method includes the following steps: (a) analyzing an integrated ...


2
Mario Garza, John V Jensen, Nicholas K Eib, Keith K Chao: Optical proximity correction method and apparatus. LSI Logic Corporation, July 31, 2001: US06269472 (251 worldwide citation)

Disclosed is a method for correcting a layout design using a design rule checker. The method includes providing a layout design file having the layout design that is to be corrected for optical proximity by the design rule checker. Providing a run set to the design rule checker. The run set includes ...


3
Mario Garza, Nicholas K Eib, John V Jensen, Keith K Chao: Performing optical proximity correction with the aid of design rule checkers. LSI Logic Corporation, Beyer Weaver & Thomas, August 28, 2001: US06282696 (209 worldwide citation)

A method is disclosed for identifying regions of an integrated circuit layout design where optical proximity correction will be most useful and then performing optical proximity correction on those regions only. More specifically, the method includes the following steps: (a) analyzing an integrated ...


4
Mario Garza, Nicholas K Eib, Keith K Chao: Optical proximity correction method and apparatus. LSI Logic Corporation, Hickman Beyer & Weaver, March 3, 1998: US05723233 (152 worldwide citation)

A photolithography optical proximity correction method for mask layouts (e.g., reticle masks) is disclosed. The method includes performing pattern recognition on a layout design to identify locations of feature edges with respect to other feature edges in the layout design. The method further includ ...


5
Mario Garza, Keith K Chao: Comparing aerial image to SEM of photoresist or substrate pattern for masking process characterization. LSI Logic Corporation, B Noel Kivlin, Conley Rose & Tayon PC, June 20, 2000: US06078738 (90 worldwide citation)

A method of simulating a masking process in which a process simulator is used to produce an aerial image. The simulator is configured to receive input information. The input information includes a digital representation of a patterned mask and a data set. Each element of the data set corresponds to ...


6
Mario Garza, Keith K Chao: Comparing aerial image to actual photoresist pattern for masking process characterization. LSI Logic Corporation, B Noel Kivlin, Conley Rose & Tayon PC, June 27, 2000: US06081659 (85 worldwide citation)

A method of simulating a masking process in which a process simulator is used to produce an aerial image. The simulator is configured to receive input information. The input information includes a digital representation of a patterned mask and a data set. Each element of the data set corresponds to ...


7
Edwin Jones, Dusan Petranovic, Ranko Scepanovic, Richard Schinella, Nicholas F Pasch, Mario Garza, Keith K Chao, John V Jensen, Nicholas K Eib: Method and apparatus for application of proximity correction with unitary segmentation. LSI Logic Corporation, Mitchell Silberberg & Knupp, December 24, 2002: US06499003 (47 worldwide citation)

The present invention is a method and apparatus for applying proximity correction to a piece of a mask pattern, by segmenting the piece into a plurality of segments, and applying proximity correction to a first segment without taking into consideration the other segments of the piece.


8
Mario Garza, Nicholas K Eib, John V Jensen, Keith K Chao: Performing optical proximity correction with the aid of design rule checkers. LSI Logic Corporation, May 4, 1999: US05900338 (42 worldwide citation)

A method is disclosed for identifying regions of an integrated circuit layout design where optical proximity correction will be most useful and then performing optical proximity correction on those regions only. More specifically, the method includes the following steps: (a) analyzing an integrated ...


9
Mario Garza, Keith K Chao: Photomask inspection method and inspection tape therefor. LSI Logic Corporation, Hickman & Martine, September 8, 1998: US05804340 (34 worldwide citation)

A method of inspecting a photomask for use in photolithography which accounts for the rounding of corners of features that occurs during manufacture of the photomask. A data tape used in the preparation of the photomask is first provided. An inspection tape is then prepared by modifying the data on ...


10
Ranko Scepanovic, Dusan Petranovic, Edwin Jones, Richard Schinella, Nicholas F Pasch, Mario Garza, Keith K Chao, John V Jensen, Nicholas K Eib: Method and apparatus for general systematic application of proximity correction. LSI Logic Corporation, January 16, 2001: US06175953 (9 worldwide citation)

The present invention is a method and apparatus for systematically applying proximity corrections to a mask pattern, wherein the pattern is divided into a grid of equally sized grid rectangles, an inner rectangle comprising a plurality of grid rectangles is formed, an outer rectangle comprising a se ...