1

2

3

4

5
Kenji Nishi, Kazuya Ota: Exposure apparatus and an exposure method. Nikon Corporation, Oliff & Berridge, September 28, 2004: US06798491 (95 worldwide citation)

An exposure apparatus and method displace first and second object holders over a base surface that extends in X- and Y-directions. The first object holder can be displaced from a third area to a second area by using a first displacement unit. The second object holder can be displaced from a first ar ...


6
Kenji Nishi, Kazuya Ota: Exposure apparatus and method. Nikon Corporation, Oliff & Berridge, February 13, 2007: US07177008 (93 worldwide citation)

A scanning exposure apparatus includes a projection system, a stage system, a first detector and a control system. The stage system has first and second stages, each of which is movable independently in a plane while holding a substrate. The first detector detects focusing information of a vicinity ...


7
Shigeru Hagiwara, Hideo Mizutani, Kazuya Ota: Alignment apparatus in projection exposure apparatus. Nikon Corporation, Oliff & Berridge, November 28, 2000: US06153886 (88 worldwide citation)

An alignment apparatus according to the present invention is constructed, for example, which is arranged in an exposure apparatus provided with a projection optical system which projects a predetermined pattern formed on a mask onto a substrate under exposure light, which performs relative positioni ...


8
Kazuya Ota, Kouichirou Komatsu: Projection scanning exposure apparatus with synchronous mask/wafer alignment system. Nikon Corporation, Shapiro and Shapiro, April 9, 1996: US05506684 (82 worldwide citation)

A scanning exposure apparatus has a mask (reticle) and a photosensitive substrate (a wafer) in an imaging relationship across a projection optical system. A mask stage and a wafer stage are moved simultaneously in first (X) direction with a speed ratio corresponding to the magnification of projectio ...


9
Kazuya Ota: Exposure apparatus, method for producing the same, and exposure method. Nikon Corporation, Oliff & Berridge, March 19, 2002: US06359678 (76 worldwide citation)

When an illumination light beam is radiated by an illumination system at a predetermined angle of incidence &thgr; with respect to a pattern plane of a mask, the illumination light beam is reflected by the pattern plane. The reflected light beam is projected by a projection optical system PO onto a ...


10
Nobutaka Magome, Kazuya Ota, Hideo Mizutani, Kouichiro Komatsu: Position detecting apparatus. Nikon Corporation, Shapiro and Shapiro, February 6, 1996: US05489986 (59 worldwide citation)

In a position detecting apparatus having an object optical system, two beams are generated for irradiating a diffraction grating formed on an object from two directions at a predetermined intersect angle for forming an interference fringe, the beams passing through a pupil plane of the object optica ...