1
Kazuya Kamon: Projection exposure apparatus and polarizer. Mitsubishi Denki Kabushiki Kaisha, Leydig Voit & Mayer, July 25, 1995: US05436761 (102 worldwide citation)

A projection exposure apparatus includes a light source, a condenser lens for condensing an illumination light emanating from the light source onto a mask including a circuit pattern, a projection lens for condensing onto a surface of a wafer the illumination light that has passed through the mask, ...


2
Kazuya Kamon: Projection exposure apparatus. Mitsubishi Denki Kabushiki Kaisha, Leydig Voit & Mayer, November 15, 1994: US05365371 (73 worldwide citation)

A projection exposure apparatus includes a light source, a condenser lens for condensing an illumination light emanating from the light source onto a mask including a circuit pattern, a projection lens for condensing onto a surface of a wafer the illumination light that has passed through the mask, ...


3
Kazuya Kamon: Apparatus and method for correcting light proximity effects by predicting mask performance. Mitsubishi Denki Kabushiki Kaisha, Leydig Voit & Mayer, September 29, 1998: US05815685 (71 worldwide citation)

An apparatus and method corrects for light proximity effects in exposure of a resist material. A circuit pattern to be formed on the wafer is defined by design data and that data is compressed for processing. The data is employed to prepare an optical projection image for transferring the circuit pa ...


4
Kazuya Kamon: Mask inspecting method and mask detector. Mitsubishi Denki Kabushiki Kaisha, Oblon Spivak McClelland Maier & Neustadt, January 2, 1996: US05481624 (61 worldwide citation)

A mask inspecting method for inspecting defects of a phase-shifting mask comprises the steps of converting pattern data of a designed circuit pattern to pattern data for a phase-shifting mask, manufacturing a phase-shifting mask as a function of the pattern data for a phase-shifting mask, detecting ...


5
Kazuya Kamon, Yasuhito Myoi, Teruo Miyamoto, Yoshie Noguchi, Masaaki Tanaka: Projection aligner. Mitsubishi Denki Kabushiki Kaisha, Leydig Voit & Mayer, September 1, 1992: US05144362 (60 worldwide citation)

A projection aligner includes a light source, a condenser lens system for directing light from the light source onto a mask on which a circuit pattern is formed, a projecting lens system for collecting on the surface of a wafer the light transmitted through the mask, and a pupillary member disposed ...


6
Kazuya Kamon: Optical pattern projecting apparatus. Mitsubishi Denki Kabushiki Kaisha, Leydig Voit & Mayer, January 17, 1995: US05382999 (60 worldwide citation)

An optical pattern projecting apparatus comprising a divergent mirror 16 for converting a light beam 13 from a light source 11 into a radially outwardly divergent light beam 13b and a convergent mirror 18 for converting the divergent light beam 13b into a radially inwardly convergent light beam 13d. ...


7
Kazuya Kamon: Projection exposure apparatus. Mitsubishi Denki Kabushiki Kaisha, Leydig Voit & Mayer, April 5, 1994: US05300972 (35 worldwide citation)

A projection exposure apparatus includes a light source, a condenser lens for condensing illumination light emanating from the light source onto a mask including a circuit pattern, a projection lens for condensing the illumination light that has passed through the mask onto a surface of a wafer, and ...


8
Kazuya Kamon: Photomask. Mitsubishi Denki Kabushiki Kaisha, Oblon Spivak McClelland Maier & Neustadt, July 20, 1993: US05229230 (35 worldwide citation)

In a photomask, a rectangular pattern to be transferred to a resist film and a plurality of auxiliary patterns are provided in a light shielding layer which is formed on a transparent plate. The auxiliary patterns are spaced from the rectangular light-transmission pattern so that the Fresnel diffrac ...


9
Kazuya Kamon, Teruo Miyamoto, Yasuhito Myoi: Projection exposure apparatus. Mitsubishi Denki Kabushiki Kaisha, Leydig Voit & Mayer, November 23, 1993: US05264898 (32 worldwide citation)

A projection exposure apparatus for use in LSI production comprises a light source, a light condensing optical system through which light from the light source is condensed and applied to a mask carrying a circuit pattern, a projection lens system which projects the light transmitted through the mas ...


10
Kazuya Kamon: Fly-eye lens device and lighting system including same. Mitsubishi Denki Kabushiki Kaisha, Oblon Spivak McClelland Maier & Neustadt, October 5, 1993: US05251067 (24 worldwide citation)

In a fly-eye lens device according to the present invention, a fly-eye lens supported by supporting means is formed by two-dimensionally arranging plural types of fly-eye constituent lenses of unequal size. In the arrangement, the plural types of the fly-eye constituent lenses are disposed in order ...