1
Kazuo Takahashi: Immersion type projection exposure apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, March 11, 1997: US05610683 (906 worldwide citation)

A projection exposure apparatus includes an illuminating device for illuminating a pattern of an original, a holder for holding a substrate, and a projection system for projecting an image of the pattern of the original onto the substrate. The projection system includes a projection optical system a ...


2
Kazuo Takahashi: Semiconductor printing apparatus with multiple independent temperature control. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, March 5, 1985: US04503335 (107 worldwide citation)

A semiconductor printing apparatus eliminates the alignment error caused by any relative deformation between the mask and the wafer due to variations in parameters such as temperature change, and intermediate processing, for example, etching etc. The apparatus is characterized by the provision of a ...


3
Masaaki Takizawa, Noboru Matsubara, Kazuo Takahashi: Dual intake valve type internal combustion engine. Toyota Jidosha Kogyo Kabushiki Kaisha, Armstrong Nikaido Marmelstein & Kubovcik, August 25, 1981: US04285310 (57 worldwide citation)

A dual intake valve type internal combustion engine comprises a main intake valve and an auxiliary intake valve. The main intake valve is so constructed that the combustible gas mixture introduced into the combustion chamber therethrough is caused to generate a swirl motion. A variable valve lift ty ...


4
Mikichi Ban, Matsuomi Nishimura, Kazuo Takahashi: Precision polishing apparatus with detecting means. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, January 11, 2000: US06012966 (51 worldwide citation)

In order to reclaim defective articles, wafers carried in from a loading unit are transported to a wafer stocker unit, a polishing unit, a pre-rinsing unit, a rinsing unit, a spin dehydrating unit and a drying unit in the named order, and in a defect inspecting device, defective articles are sorted ...


5
Ryuichi Kemi, Kazuo Takahashi, Itaru Fujita: Projection exposure apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, April 25, 1989: US04825247 (50 worldwide citation)

An exposure apparatus particularly suitable usable for the manufacture of semiconductor microcircuit is disclosed. The apparatus includes a specific arrangement that allows accurate and precise detection of any change in the imaging magnification and/or the image surface position of a projection opt ...


6
Kazuo Takahashi, Norioki Fujimoto, Masashi Takazawa, Takashi Odaira, Tomohito Koizumi, Kiyondo Kobayashi, Syozo Kato, Tetsuo Miyamoto, Mamoru Kubo: Solar lighting apparatus and controller for controlling the solar lighting apparatus. Sanyo Electric, Oblon Spivak McClelland Maier & Neustadt P C, March 17, 1998: US05729387 (43 worldwide citation)

A solar lighting apparatus according to the present inveniton is configured so that one lighting prism plate is rotatably arranged in a lighting portion or a plurality of lighting prism plates are rotatably arranged in the lighting portion at intervals of a predetermined distance, and a prism angle ...


7
Masaaki Takizawa, Kazuo Takahashi, Noboru Matsubara: Variable valve lift mechanism used in an internal combustion engine. Toyota Jidosha Kogyo Kabushiki Kaisha, Finnegan Henderson Farabow Garrett & Dunner, March 31, 1981: US04258671 (41 worldwide citation)

A hydraulic tappet is used in a variable valve lift engine. The tappet comprises an outer case having a pressure chamber formed therein, an inner case having an oil chamber formed therein and engaged within the outer case, and a check valve disposed between the pressure chamber and the oil chamber. ...


8
Takashi Kamono, Matsuomi Nishimura, Kazuo Takahashi, Osamu Ikeda, Satoshi Ohta: Polishing apparatus and method. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, February 6, 2001: US06183345 (40 worldwide citation)

In order to efficiently polish a large-area member to be polished to a desired shape, a polishing apparatus includes a first polishing station including a first holding unit for holding a member to be polished in a state in which a surface to be polished thereof is upwardly placed, and a first polis ...


9
Kiyoshi Takahashi, Kazuo Takahashi: Forceps for semiconductor silicon wafer. Fleit Jacobson Cohn & Price, August 30, 1988: US04767142 (39 worldwide citation)

A vacuum-forceps is disclosed. A valve chamber is provided between a first suction passage communicating with an adsorptive member and a second suction passage connected through a suction tube to a vacuum source. A valve member linked to an operating push button is accomodated in the valve chamber. ...


10
Kazuo Takahashi: Carry device for fine movement. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, August 23, 1988: US04766465 (38 worldwide citation)

A carriage for fine movement includes a stationary stage, a movable stage slidably provided thereon, a moving mechanism, coupled to the stationary and movable stages, for moving the movable stage relative to the stationary stage, wherein at least one of the stationary stage, movable stage and moving ...



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