1
Kazuko Yamamoto, Sachiko Miyama, Kiyomi Koyama, Soichi Inoue: Optical proximity correction system. Kabushiki Kaisha Toshiba, Oblon Spivak McClelland Maier & Neustadt P C, June 20, 2000: US06077310 (279 worldwide citation)

Pattern data that is an object of correction is divided into an area on which correction is made using correction values that have been obtained in advance for patterns and their respective layouts and an area on which correction is made on the basis of correction values calculated by a simulator. F ...


2
Kazuko Yamamoto, Sachiko Miyama, Kiyomi Koyama, Soichi Inoue: Optical proximity correction method. Kabushiki Kaisha Toshiba, Oblon Spivak McClelland Maier & Neustadt P C, March 9, 1999: US05879844 (111 worldwide citation)

Pattern data that is an object of correction is divided into an area on which correction is made using correction values that have been obtained in advance for patterns and their respective layouts and an area on which correction is made on the basis of correction values calculated by a simulator. F ...


3
Sachiko Kobayashi, Taiga Uno, Kazuko Yamamoto, Koji Hashimoto: Mask data design method. Kabushiki Kaisha Toshiba, Finnegan Henderson Farabow Garrett & Dunner L, June 5, 2001: US06243855 (89 worldwide citation)

A correction target segment extracted from the design pattern is divided into lengths suited for correction. If the arrangement of the divided segments is a one-dimensional pattern, a correction value is obtained by conducting a one-dimensional process simulation to an arrangement within a predeterm ...


4
Taiga Uno, Kiyomi Koyama, Kazuko Yamamoto, Satoshi Tanaka, Sachiko Kobayashi, Koji Hashimoto: Method for designing Levenson photomask. Kabushiki Kaisha Toshiba, Oblon Spivak McClelland Maier & Neustadt P C, December 21, 1999: US06004701 (23 worldwide citation)

In a Levenson photomask design method of partially forming a plurality of opening patterns for passing incident light in a light-shielding film for shielding the incident light, and arranging, on some patterns, phase shifters, line segment pairs of different patterns which are adjacent to each other ...


5
Kazuko Yamamoto: Potty for pet animals. Bierman Muserlian and Lucas, December 3, 2002: US06487989 (16 worldwide citation)

The potty for a pet animal of the present invention comprises an outer case for the potty, an internal case to be contained in the outer case and is constituted by having an opening at the bottom part and forming a reticular member at the opening part, where an amount of sand is provided on the upwa ...


6
Kazuko Yamamoto: Method and program for processing design pattern of semiconductor integrated circuit. Kabushiki Kaisha Toshiba, Kilpatrick Stockton, October 21, 2003: US06637010 (13 worldwide citation)

A method for processing design pattern data of a semiconductor integrated circuit includes determining whether or not there are lower-level cells whose individual size is equal to or below a threshold, and if there are such lower-level cells whose individual size is equal to or below the threshold, ...


7
Kazuko Yamamoto, Hideki Matsukawa, Hiroshi Esaki, Kazushi Nonaka: Transmission type liquid crystal display device. Matsushita Electric Industrial, Stevens Davis Miller & Mosher, September 17, 1991: US05048932 (8 worldwide citation)

The display device includes two transparent substrates which enclose therebetween a liquid crystal having dichroic dye dissolved therein. A back light source assembly is disposed behind the transparent substrates. A dummy voltage is applied across the liquid crystal even in the non-operating mode in ...


8
Toshiya Kotani, Shoji Mimotogi, Soichi Inoue, Kazuko Yamamoto: Method of designing an LSI pattern to be formed on a specimen with a bent portion. Kabushiki Kaisha Toshiba, Finnegan Henderson Farabow Garrett & Dunner L, June 19, 2001: US06249900 (5 worldwide citation)

In a method of designing an LSI pattern, before pattern designing, the length B and line width W of a rectangle obtained by dividing a bent design pattern are used as parameters. A line width C at which a desired line width W is obtained for the length B of the rectangle is determined to be a correc ...


9
Soichi Inoue, Iwao Higashikawa, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto: Pattern forming method. Kabushiki Kaisha Toshiba, Oblon Spivak McClelland Maier & Neustadt P C, March 21, 2000: US06040114 (5 worldwide citation)

A method of forming a pattern for a semiconductor device comprises the steps of forming a photosensitive film on a substrate and radiating the photosensitive film on the substrate with a beam of a predetermined shape consisting of one of a charged particle beam and an electromagnetic beam, thereby f ...


10
Taiga Uno, Kiyomi Koyama, Kazuko Yamamoto: Method and a system for designing a photomask for use in manufacture of a semiconductor device. Kabushiki Kaisha Toshiba, Oblon Spivak McClelland Maier & Neustadt P C, August 18, 1998: US05795683 (4 worldwide citation)

A method for designing a photomask, used in photolithography using partially coherent incident light, the photomask having a substrate on which a plurality of transparent regions and opaque regions are formed, the transparent regions including a phase shifter for providing the incident light transmi ...