1
Karl Amundson, Jianna Wang: Solvent annealing process for forming a thin semiconductor film with advantageous properties. E Ink Corporation, Testa Hurwitz & Thibeault, November 6, 2001: US06312971 (327 worldwide citation)

A process for forming a relatively high quality, lower cost organic semiconductor film is provided. A substrate is formed by depositing an organic semiconductor film via a lower cost method such as printing or spin coating on a support substrate. A portion of a solvent is vaporized to bring the vapo ...


2
Karl Amundson, Paul S Drzaic, Jianna Wang, Gregg Duthaler, Peter Kazlas: Method for forming a patterned semiconductor film. E Ink Corporation, Testa Hurwitz & Thibeault, December 24, 2002: US06498114 (280 worldwide citation)

A process for forming a pattern in a semiconductor film is provided. The process comprises the steps of: providing a substrate; providing an organic semiconductor film adjacent the substrate; and providing a destructive agent adjacent selected portions of the organic semiconductor film, the destruct ...