1
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R Medeiros, Wayne Martin Moreau, Karen E Petrillo, John P Simons: Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof. International Business Machines Corporation, Thomas A Berk, Daniel P Morris, April 22, 2008: US07361444 (9 worldwide citation)

Disclosed are multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist st ...


2
Katherina Babich
Marie Angelopoulos, Edward D Babich, Inna V Babich, Katherina E Babich, James J Bucchignano, Karen E Petrillo, Steven A Rishton: Forming a pattern of a negative photoresist. International Business Machines Corporation, Daniel P Morris, Pollock Vande Sande & Amernick, June 26, 2001: US06251569 (9 worldwide citation)

A new group of non-chemically amplified negative tone water/aqueous base developable (photo) resists based on redistribution of carbon-oxygen bonds in pendant ester groups of the polymers has been found.


3
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R Medeiros, Wayne Martin Moreau, Karen E Petrillo, John P Simons: Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof. International Business Machines Corporation, Thomas A Beck, Daniel P Morris, May 4, 2010: US07709177 (5 worldwide citation)

Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibi ...


4
Katherina Babich
Marie Angelopoulos, Edward D Babich, Inna V Babich, Katherina E Babich, James J Bucchignano, Karen E Petrillo, Steven A Rishton: Forming a pattern of a negative photoresist. International Business Machines Corporation, Daniel P Morris, Connolly Bove Lodge & Hutz, September 9, 2003: US06617086 (1 worldwide citation)

A new group of non-chemically amplified negative tone water/aqueous base developable (photo) resists based on redistribution of carbon-oxygen bonds in pendant ester groups of the polymers has been found.


5
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R Medeiros, Wayne Martin Moreau, Karen E Petrillo, John P Simons: Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof. International Business Machines Corporation, Thomas A Beck, Daniel P Morris, June 15, 2010: US07736833

Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibi ...


6
Katherina Babich
Marie Angelopoulos, Edward D Babich, Inna V Babich, Katherina E Babich, James J Bucchignano, Karen E Petrillo, Steven A Rishton: Forming a pattern of a negative photoresist. International Business Machines Corporation, Connolly Bove Lodge & Hutz, September 5, 2002: US20020123010-A1

A new group of non-chemically amplified negative tone water/aqueous base developable (photo) resists based on redistribution of carbon-oxygen bonds in pendant ester groups of the polymers has been found.


7
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Douglas Charles Latulipe, Qinghuang Lin, David R Medeiros, Wayne Martin Moreau, Karen E Petrillo, John P Simons: Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof. Thomas A Beck, May 29, 2008: US20080124650-A1

Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibi ...


8
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R Medeiros, Wayne Martin Moreau, Karen E Petrillo, John P Simons: Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof. Thomas A Beck, May 29, 2008: US20080124649-A1

Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibi ...


9
James J Bucchignano, Wu Song Huang, Ahmad D Katnani, Kim Y Lee, Wayne M Moreau, Karen E Petrillo: E-beam application to mask making using new improved KRS resist system. International Business Machines Corporation, Steven Capella Esq, Scully Scott Murphy & Presser, March 14, 2000: US06037097 (21 worldwide citation)

The present invention relates to chemically amplified resists and resist systems wherein some of the polar functional groups of the aqueous base soluble polymer or copolymers are protected with a cyclic aliphatic ketal protecting group such as methoxycyclohexanyl. The resists and the resist systems ...


10
James J Bucchignano, Wu Song Huang, Ahmad D Katnani, Kim Y Lee, Wayne M Moreau, Karen E Petrillo: E-beam application to mask making using new improved KRS resist system. International Business Machines Corporation, Steven Capella Esq, Scully Scott Murphy & Presser, March 28, 2000: US06043003 (16 worldwide citation)

The present invention relates to chemically amplified resists and resist systems wherein some of the polar functional groups of the aqueous base soluble polymer or copolymers are protected with a cyclic aliphatic ketal protecting group such as methoxycyclohexanyl. The resists and the resist systems ...