1
Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser: Imaging apparatus. ASML Netherlands, Pillsbury Winthrop, August 17, 2004: US06778257 (424 worldwide citation)

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub ...


2
Pieter Willem Herman de Jager, Pieter Kruit, Arno Jan Bleeker, Karel Diederick van der Mast: Lithographic apparatus, device manufacturing method, and device manufactured thereby. Shirley L Church, October 14, 2003: US06633366 (26 worldwide citation)

Various options for improving throughput in an e-beam lithography apparatus are described. A slider lens moves in synchronism with the scanning motion of the electron beam.


3
Kars Zeger Troost, Karel Diederick Van Der Mast: Lithographic apparatus and device manufacturing method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, October 3, 2006: US07116403 (24 worldwide citation)

Lithographic apparatus providing a patterned beam of radiation in which radiation that is linearly polarized in a first direction has a first pattern and radiation that is linearly polarized in an orthogonal direction has a second pattern.


4
Marcellinus P C M Krijn, Karel Diederick Van Der Mast: Correction device for correcting the spherical aberration in particle-optical apparatus. Philips Electron Optics, Fulbright & Jaworski, February 20, 2001: US06191423 (19 worldwide citation)

Electron-optical rotationally symmetrical lenses inevitably suffer from spherical aberration which often imposes a limit on the resolution. This lens defect cannot be eliminated by compensation by means of rotationally symmetrical fields. In order to enhance the resolution nevertheless, it has alrea ...


5
Yvonne Wendela Kruijt Stegeman, Raymond Jacobus Knaapen, Johan Frederik Dijksman, Krassimir Todorov Krastev, Sander Frederik Wuister, Aleksey Yurievich Kolesnychenko, Karel Diederick Van Der Mast, Klaus Simon: Imprint lithography. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 14, 2009: US07517211 (11 worldwide citation)

An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can ...


6
Kars Zeger Troost, Johannes Jacobus Matheus Baselmans, Karel Diederick Van Der Mast: Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, March 3, 2009: US07500218 (9 worldwide citation)

Grayscale Optical Proximity Correction device features are added to a mask pattern by convoluting the device features with a two-dimensional correction kernel or two one-dimensional correction kernels to generate grayscale OPC features. The resulting pattern may be used in a projection lithography a ...


7
Klaus Simon, Karel Diederick Van Der Mast, Johan Frederik Dijksman: Imprint lithography. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, February 1, 2011: US07878791 (7 worldwide citation)

A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is mo ...


8
Arie Jeffrey Den Boef, Karel Diederick Van Der Mast, Maurits Van Der Schaar: Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatus. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, February 2, 2010: US07656518 (7 worldwide citation)

In a method of measuring asymmetry in a scatterometer, a target portion is illuminated twice, first with 0° of substrate rotation and secondly with 180° of substrate rotation. One of those images is rotated and then that rotated image is subtracted from the other image. In this way, asymmetry of the ...


9
Jan Bart LePoole, Karel Diederick VAN DER Mast: Electron microscope. U S Philips Corporation, Frank R Trifari, June 13, 1978: US04095104 (7 worldwide citation)

In an electron microscope having a comparatively high resolution, a tilting motion about a point in an object to be imaged is imparted to the illuminating electron beam in order to adjust the coherence of the exposure of an object. For the exposure aperture, the aperture given by the degree of defle ...


10
Reinder Teun Plug, Arie Jeffrey Den Boef, Karel Diederick Van Der Mast: Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, March 10, 2009: US07502103 (6 worldwide citation)

A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table constructed and arranged to hold the substrate, at least one sensor constructed and arranged to measure a ...