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Takao Sawabe, Ryuichiro Yoshimura, Junichi Yoshio, Akihiro Tozaki, Yoshiaki Moriyama, Kaoru Yamamoto: Information record medium, apparatus for recording the same and apparatus for reproducing the same. Pioneer Electronic Corporation, Morgan Lewis & Bockius, October 24, 2000: US06137954 (172 worldwide citation)

An information recording apparatus (SSI) is provided with: a signal process device (72) for applying a predetermined signal process to a plurality of partial record information blocks constructing whole record information (R) to thereby generate processed partial record information blocks (Sr) each ...


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Akihiro Tozaki, Takao Sawabe, Ryuichiro Yoshimura, Yoshiaki Moriyama, Kaoru Yamamoto, Junichi Yoshio: Information recording medium, apparatus for recording the same and apparatus for reproducing the same. Pioneer Electronic Coporation, Morgan Lewis & Bockius, March 17, 1998: US05729516 (95 worldwide citation)

In a recording medium such as a DVD, various information such as video and audio information is recorded in a form of a plurality of recorded information pieces. Further, control information pieces prescribe the manner of reproducing the recorded information pieces. Copy information indicating wheth ...


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Taro Ikeda, Sumi Tanaka, Kaoru Yamamoto: Substrate supporting structure for semiconductor processing, and plasma processing device. Tokyo Electron, Oblon Spivak McClelland Maier & Neustadt L, November 23, 2010: US07837828 (88 worldwide citation)

A substrate supportingstructure (50) for semiconductor processing, comprising a mounting table (51) for placing a processed substrate (W) disposed in a processing chamber (20), wherein temperature control spaces (507) for storing the fluid used as a heat exchange medium are formed in the mounting ta ...


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Takao Sawabe, Ryuichiro Yoshimura, Yoshiaki Moriyama, Kaoru Yamamoto, Akihiro Tozaki, Junichi Yoshio: Information record medium, apparatus for recording the same and apparatus for reproducing the same. Pioneer Electronics Corporation, Morgan Lewis & Bockius, November 14, 2000: US06148138 (69 worldwide citation)

An information recording apparatus (SS1) is provided with a signal process device (72). The signal process device divides record information (R) into a plurality of partial record information pieces, and applies a predetermined signal process to each of them to output processed partial record inform ...


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Kaoru Yamamoto, Hirohide Kobori, Takao Sawabe, Junichi Yoshio, Ryuichiro Yoshimura, Yoshiaki Moriyama, Akihiro Tozaki: Information record medium, apparatus for recording the same and apparatus for reproducing the same. Pioneer Electronic Corporation, Morgan Lewis & Bockius, April 21, 1998: US05742569 (63 worldwide citation)

An information recording apparatus is provided with a signal process device for generating and outputting content information including (i) identification information to identify each of partial record informations constructing whole record information to be recorded onto an information record mediu ...


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Kaoru Yamamoto, Nobuhiko Ito, Yoshimitsu Yamauchi: Nonvolatile semiconductor storage device. Sharp Kabushiki Kaisha, Morrison & Foerster, August 20, 2002: US06438035 (60 worldwide citation)

There is provided a nonvolatile semiconductor storage device capable of securing sufficient read accuracy without providing superfluous sense time margin when there are variations in temperature and transistor characteristics. This nonvolatile semiconductor storage device includes a reference cell


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Kaoru Yamamoto, Nobuhiko Ito: BIT LINE CONTROL DECODER CIRCUIT, VIRTUAL GROUND TYPE NONVOLATILE SEMICONDUCTOR STORAGE DEVICE PROVIDED WITH THE DECODER CIRCUIT, AND DATA READ METHOD OF VIRTUAL GROUND TYPE NONVOLATILE SEMICONDUCTOR STORAGE DEVICE. Sharp Kabushiki Kaisha, Morrison & Foerster, June 1, 2004: US06744667 (55 worldwide citation)

There is provided a virtual ground type nonvolatile semiconductor storage device capable of effectively suppressing a leak current to the adjacent cell and thereby achieving high-speed read. During read operation, a ground potential GND is applied to a bit line SBL


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Tadahiro Ishizaka, Kaoru Yamamoto: Plasma enhanced atomic layer deposition system and method. Tokyo Electron, Oblon Spivak McClelland Maier & Neustadt P C, January 1, 2008: US07314835 (50 worldwide citation)

A method for depositing a film on a substrate using a plasma enhanced atomic layer deposition (PEALD) process includes disposing the substrate in a process chamber configured to facilitate the PEALD process. A first process material is introduced within the process chamber, and a second process mate ...