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Junichi Sato, Toshiaki Hasegawa, Hiroshi Komatsu: Multi-chamber wafer process equipment having plural, physically communicating transfer means. Sony Corporation, Hill Steadman & Simpson, February 15, 1994: US05286296 (166 worldwide citation)

In a multi-chamber process equipment in which a plurality of process chambers for processing a single wafer are connected with a wafer transfer chamber in parallel through respective gate valves, and a wafer transfer means is provided for carrying the wafer between the wafer transfer chamber and eac ...


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Koji Taniguchi, Hiroyuki Tada, Junichi Sato, Takao Yamaguchi: Content processing apparatus and content display apparatus based on location information. Panasonic Corporation, Greenblum & Bernstein, December 9, 2008: US07461528 (140 worldwide citation)

The present invention receives list content providing location conditions in a list organized by location conditions in which a reference destination of location-dependent content, being content assigned correspondence to geographical location information, is compiled for each location condition, se ...


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Yuichi Umeda, Junichi Sato: Capacitance detector circuit, capacitance detection method, and fingerprint sensor using the same. Alps Electric, Beyer Weaver & Thomas, July 11, 2006: US07075316 (69 worldwide citation)

A capacitance detecting circuit of a capacitive sensor having a plurality of column lines and a row line intersecting the column lines detects a change in capacitance at an intersection of a column line and a row line. The circuit includes a PN code generating unit for generating a code having ortho ...


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Junichi Sato, Tomoyoshi Yamada, Junichiro Naito, Kunihisa Shigenobu, Kouichi Sato: Vibration damping soundproof sheets for use in vehicles. Toyoda Gosei, Cushman Darby & Cushman, March 29, 1988: US04734323 (54 worldwide citation)

This invention is directed to a vibration damping soundproof sheet for use in vehicles, in which the surface of the soundproof layer is made flat irrespective of the or uneven configuration at the surface of a vehicle. The soundproof layer-forming material comprises a formed rubber blend in which a ...


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Junichi Sato, Takao Yamaguchi, Tomoaki Itoh: Terminal apparatus for acquiring position-related content. Matsushita Electric Industrial, Greenblum & Bernstein, April 10, 2007: US07203597 (47 worldwide citation)

A terminal apparatus is provided with a content list storage section that stores a content list storing at least one pair of an address of content related to a position and the position. A position detecting section detects a position, a specifying section which defines a region including an area fo ...


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Junichi Sato: Method of filling a recess flat with a material by a bias ECR-CVD process. Sony Corporation, Hill Van Santen Steadman & Simpson, January 26, 1993: US05182221 (45 worldwide citation)

A method of filling a recess so that it is flat with a material by a bias ECR-CVD process is capable of depositing the recess with the material without resulting in the increase in the aspect ratio of the recess with the progress of the deposition process and without forming any voids in the materia ...


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Junichi Sato: Apparatus for polishing. Sony Corporation, Ronald P Kananen, September 21, 1993: US05246525 (43 worldwide citation)

An apparatus for polishing a substrate is composed of a polishing plate having a pad on the surface thereof, a substrate retainer to retain the substrate being faced with exposed surface of the pad, allowing the exposed surface of the substrate to contact the surface of the pad, a slurry supply mean ...


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Junichi Sato: Manufacturing method for diamond semiconductor device. Sony Corporation, Hill Steadman & Simpson, May 7, 1996: US05514603 (38 worldwide citation)

A process of forming a semiconductor which allows n type doping to be applied to a diamond semiconductor layer is carried out so as to form a diamond semiconductor layer on a substrate, forming a layer of SiO.sub.2 over the diamond semiconductor layer and forming a resist pattern (14) over the SiO.s ...


10
Junichi Sato: Plasma processing apparatus. Sony Corporation, Hill Steadman & Simpson, July 5, 1994: US05326404 (33 worldwide citation)

A plasma processing apparatus for processing a semiconductor wafer by using a plasma to fabricate a semiconductor device comprises: a film forming vessel having at least one film forming chamber for forming a Ti/TiN laminate layer or a Ti/TiON/TiN laminate layer on a semiconductor wafer therein; and ...