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Rene Theodorus Petrus Compen, Joost Jeroen Ottens: Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, June 10, 2008: US07385670 (37 worldwide citation)

A lithographic apparatus is disclosed. The apparatus includes a cleaning system for cleaning a component in the lithographic apparatus in situ. The cleaning system is arranged to provide a cleaning environment in proximity of a predetermined position on a component to be cleaned. The system is also ...


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Martinus Hendrikus Antonius Leenders, Nicolaas Rudolf Kemper, Joost Jeroen Ottens: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 4, 2011: US07864292 (25 worldwide citation)

An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce t ...


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Theodorus Petrus Maria Cadee, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens, Frederick Eduard De Jong, Koen Goorman, Boris Menchtchikov, Marco Koert Stavenga, Martin Frans Pierre Smeets, Aschwin Lodewijk Hendricus Johannes Van Meer, Bart Leonard Peter Schoondermark, Patricius Aloysius Jacobus Tinnemans, Stoyan Nihtianov: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 4, 2007: US07304715 (24 worldwide citation)

A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patt ...


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Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Frits Van der Meulen, Joost Jeroen Ottens, Anko Jozef Cornelus Sijben, Wouterus Johannes Petrus Maria Maas, Hendrikus Johannes Marinus Van Abeelen, Henricus Petrus Versteijnen, Paula Steffens: Lithographic apparatus and method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 22, 2013: US08564763 (19 worldwide citation)

A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.


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Joost Jeroen Ottens, Noud Jan Gilissen, Martinus Hendrikus Antonius Leenders, Koen Jacobus Johannes Maria Zaal: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 12, 2008: US07411657 (18 worldwide citation)

A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds th ...


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Joost Jeroen Ottens, Noud Jan Gilissen, Martinus Hendrikus Antonius Leenders: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 12, 2011: US07978306 (16 worldwide citation)

A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds th ...


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Jeroen Johannes Sophia Maria Mertens, Aschwin Lodewijk Hendricus Johannes Van Meer, Joost Jeroen Ottens, Edwin Van Gompel: Apparatus, method for supporting and/or thermally conditioning a substrate, a support table, and a chuck. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 12, 2009: US07532310 (15 worldwide citation)

An apparatus includes a support table for supporting a substrate. The support table includes a plurality of support protrusions that contact the substrate during use for supporting the substrate. The support table includes a plurality of heat transfer protrusions that extend towards the substrate du ...


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