1
Jong Chul Lee: Hydroponic device for plant cultivation. Harvey Kaye, Jerry Cohen, August 15, 1995: US05440836 (25 worldwide citation)

A hydroponic device comprises a reservoir for containing culture fluid therein, one or more cultivation beds placed on the reservoir one above the other, a conduit extending vertically upwardly from the reservoir up to an uppermost cultivation bed and a fluid pump mounted on the reservoir for forced ...


2
Jong Chul Lee: Gel-form lipstick. Foley & Lardner, August 2, 2005: US06923587 (16 worldwide citation)

Disclosed herein is a gel-form lipstick dispenser which may discharge gel-form lipstick materials with very high viscosity safely.


3
Eun Tae Park, Jeong Joo Kim, Hee Young Lee, Eun Sub Lim, Jong Chul Lee, Yul Kyo Chung: High-dielectric constant metal-ceramic-polymer composite material and method for producing embedded capacitor using the same. Samsung Electro-Mechanics, McDermott Will & Emery, October 27, 2009: US07609504 (4 worldwide citation)

The invention relates to a high-dielectric constant metal/ceramic/polymer composite material and a method for producing an embedded capacitor. As ceramic particles having a relatively small size are bound to the surface of metal particles having a relatively large size by mixing, the occurrence of p ...


4
Jong Chul Lee: Women's elastic free size winter shirts. December 31, 2002: US06499142 (3 worldwide citation)

A woman's shirts having an omasum-inner-wall like textile structure, defined as a bulbous unit above a planar base, to render desired elasticity to a shirt. The shirt of this invention is excellent in resilient elasticity, original shape retainability and shape stability. The shirts of this inv ...


5
Jong Chul Lee, Sang Hyuck Park: Apparatus for treating thin film and method of treating thin film. LG DISPLAY, Brinks Gilson & Lione, December 1, 2015: US09200369 (1 worldwide citation)

An apparatus and method for treating a thin film on a substrate is presented. The substrate is loaded on a fixed stage adapted to receive the substrate. An energy source is aligned through a space in a gas shield so as to face a thin film on the substrate to be repaired after the substrate is loaded ...


6
Jong Chul Lee, Eui Hwan Son: Gasket. KUK IL INNTOT, Cantor Colburn, October 23, 2018: US10107400

Provided is a gasket characterized in that a perfect sealing can be achieved even under the vacuum and the high pressure operating conditions due to the insulation material embedded between the metal cores, the insulation material adhered or attached to the metal cores, or the sealing material addit ...


7
Kyoo Ho Jung, Byung Jick Cho, Jong Chul Lee, Won Ki Ju: Electronic device with variable resistive patterns. SK HYNIX, August 16, 2016: US09418008

An electronic device includes a semiconductor memory unit. The semiconductor memory unit includes a plurality of first lines extending in a first direction, a plurality of second lines extending in a second direction intersecting the first direction, and a plurality of variable resistance patterns t ...


8
Jong Chul Lee, Beom Yong Kim, Hyung Dong Lee: Threshold switching device, method for fabricating the same and electronic device including the same. SK HYNIX, January 9, 2018: US09865651

A threshold switching device may include: a first electrode layer; a second electrode layer; a first insulating layer interposed between the first and second electrode layers, and provided adjacent to the first electrode layer; and a second insulating layer interposed between the first and second el ...


9
Kyung Wan Kim, Jong Chul Lee, Jong Gi Kim: Threshold switching device and electronic device including the same. SK HYNIX, January 9, 2018: US09865652

A threshold switching device may include: a first electrode layer; a second electrode layer; an insulating layer interposed between the first and second electrode layers and containing a plurality of neutral defects; and an additional insulating layer interposed between the insulating layer and one ...


10
Jong Chul Lee, Je Sup Lee, Sang Hyuck Park: Apparatus for treating thin film and method of treating thin film. LG Display, Brinks Hofer Gilson & Lione, November 16, 2010: US07833350

An apparatus for treating a substrate includes a stage adapted to receive the substrate; a gas shield facing the substrate and having a retention space, the gas shield including: a top plate; a bottom plate facing the substrate and having pump holes around the retention space; and a middle plate bet ...