1
John Prince: Fuzzy database retrieval. America Online, Perkins Coie, April 5, 2005: US06877002 (95 worldwide citation)

A method for querying metadata associated with media, such as multimedia and/or streaming media, on a computer network includes separating the metadata into keywords. The keywords are compared with valid keywords. A score is calculated in accordance with the degree of similarity between the keywords ...


2
Manoocher Birang, John Prince: Apparatus and method to determine the coefficient of friction of a chemical mechanical polishing pad during a pad conditioning process and to use it to control the process. Applied Materials, Fish & Richardson P C, April 28, 1998: US05743784 (51 worldwide citation)

An apparatus and method for detecting the roughness of a CMP pad surface, in situ, during pad conditioning by measuring and making use of surface friction effects. The effect is advantageously exploited to determine an endpoint for the pad conditioning process i.e. when the surface roughness of the ...


3
Manoocher Birang, John Prince: End effector for pad conditioning. Applied Materials, Dugan & Dugan, December 12, 2000: US06159087 (39 worldwide citation)

An end effector is provided for conditioning pads used to polish semiconductor wafers. The end effector has a substrate with a matrix (preferably a polymer) disposed thereon. Abrasive particles such as diamond crystals are embedded in the matrix. Preferred particle size and number/spacing is provide ...


4
Allan Gleason, Manoocher Birang, John Prince, Mohsen Salek, Syed Askari: Retainers and non-abrasive liners used in chemical mechanical polishing. Applied Materials, Moser Patterson & Sheridan, May 21, 2002: US06390904 (38 worldwide citation)

The present invention provides a retaining ring having an resilient liner for protecting the substrate edge from being damaged during chemical mechanical polishing and a method for making the same. Retainers made of wear resistant ceramics, such as alumina, provide better overall performance, includ ...


5
Robert D Tolles, Tsungan Cheng, John Prince: Carrier head with layer of conformable material for a chemical mechanical polishing system. Applied Materials, Fish & Richardson, March 14, 2000: US06036587 (37 worldwide citation)

A carrier head for a chemical mechanical polishing apparatus. A layer of conformable material is disposed in a recess of the carrier head to provide a mounting surface for a substrate. The conformable material may be elastic and undergo normal strain in response to an applied load. The carrier head ...


6
John Prince: Substrate retaining ring. Applied Materials, Fish & Richardson, August 5, 2003: US06602116 (32 worldwide citation)

A retaining ring is configured for use with an apparatus for polishing a substrate. The substrate has upper and lower faces and a perimeter. The apparatus has a movable polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retaining ring has ...


7
John Prince: Substrate retaining ring. Applied Materials, Fish & Richardson, September 12, 2000: US06116992 (29 worldwide citation)

A retaining ring is configured for use with an apparatus for polishing a substrate. The substrate has upper and lower faces and a perimeter. The apparatus has a movable polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retaining ring has ...


8
Sen Hou Ko, Richard V Rafloski, James C Nystrom, John Prince, Alfred A Goldspiel, Stephen J Blumenkranz, Manoocher Birang: Linear conditioner apparatus for a chemical mechanical polishing system. Applied Materials, Fish & Richardson, August 17, 1999: US05938507 (19 worldwide citation)

A conditioner apparatus uses one or more linear conditioners. The linear conditioners extend from the edge of the polishing pad almost to the center of the pad. The conditioner apparatus may use two conditioner rods located on either side of a radial segment. The rods gimbal so that if one rod rises ...


9
Manoocher Birang, John Prince, James Nystrom: Magnetic carrier head for chemical mechanical polishing. Applied Materials, Fish & Richardson, November 23, 1999: US05989103 (10 worldwide citation)

A carrier head assembly including a drive shaft and a system flange connectable to the drive shaft where the system flange includes a number of magnetic plates. The carrier head assembly also includes a carrier head flange. The carrier head flange has more magnetic plates, these magnetic plates gene ...


10
Robert D Tolles, Tsungan Cheng, John Prince: Carrier head with layer of conformable material for a chemical mechanical polishing system. Applied Materials, Fish & Richardson, September 3, 2002: US06443823 (10 worldwide citation)

A carrier head for a chemical mechanical polishing apparatus. A layer of conformable material is disposed in a recess of the carrier head to provide a mounting surface for a substrate. The conformable material may be elastic and undergo normal strain in response to an applied load. The carrier head ...