1
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R Medeiros, Wayne Martin Moreau, Karen E Petrillo, John P Simons: Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof. International Business Machines Corporation, Thomas A Berk, Daniel P Morris, April 22, 2008: US07361444 (9 worldwide citation)

Disclosed are multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist st ...


2
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R Medeiros, Wayne Martin Moreau, Karen E Petrillo, John P Simons: Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof. International Business Machines Corporation, Thomas A Beck, Daniel P Morris, May 4, 2010: US07709177 (5 worldwide citation)

Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibi ...


3
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R Medeiros, Wayne Martin Moreau, Karen E Petrillo, John P Simons: Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof. International Business Machines Corporation, Thomas A Beck, Daniel P Morris, June 15, 2010: US07736833

Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibi ...


4
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Douglas Charles Latulipe, Qinghuang Lin, David R Medeiros, Wayne Martin Moreau, Karen E Petrillo, John P Simons: Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof. Thomas A Beck, May 29, 2008: US20080124650-A1

Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibi ...


5
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R Medeiros, Wayne Martin Moreau, Karen E Petrillo, John P Simons: Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof. Thomas A Beck, May 29, 2008: US20080124649-A1

Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibi ...


6
Kenneth J McCullough, Wayne M Moreau, John P Simons, Charles J Taft, John M Cotte: Apparatus and method for increasing throughput in fluid processing. International Business Machines, Daniel P Morris Esq, Perman & Green, May 13, 2003: US06561220 (34 worldwide citation)

A method and an apparatus, the apparatus including appropriate valves and conduits, for increasing throughput in pressurized fluid processing including storing in a storage chamber of the apparatus a quantity of fluid at a pressure higher than a pressure at which an operation is to take place, while ...


7
John Michael Cotte, Donald J Delehanty, Kenneth John McCullough, Wayne Martin Moreau, John P Simons, Charles J Taft, Richard P Volant: Process for removing chemical mechanical polishing residual slurry. International Business Machines Corporation, Daniel P Morris, Scully Scott Murphy & Presser, July 30, 2002: US06425956 (24 worldwide citation)

A process of removing residual slurry resulting from chemical mechanical polishing of a workpiece in which the workpiece is contacted with a composition of a supercritical fluid, said supercritical fluid including supercritical, carbon dioxide and a co-solvent, and a surfactant.


8
John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, John P Simons, Charles J Taft: Process for depositing a film on a nanometer structure. International Business Machines Corporation, Daniel P Morris, Scully Scott Murphy & Presser, September 17, 2002: US06451375 (14 worldwide citation)

A process of depositing a thin film on a nanometer structure in which a coating, which may be an aerogel material or metallic seed layer, is prepared. The coating is combined with a supercritical composition to form a supercritical coating composition. The supercritical coating composition is deposi ...


9
John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, John P Simons, Charles J Taft, Richard P Volant: Check valve for micro electro mechanical structure devices. International Business Machines Corporation, Daniel P Morris, Scully Scott Murphy & Presser, December 28, 2004: US06834671 (12 worldwide citation)

A check valve for micro electro mechanical structure devices (MEMS), and in particular pertains to a check valve which is adapted to be employed in connection with micro electro mechanical structure devices which are intended to be employed with supercritical fluids constituting working fluids. In a ...


10
John P Simons, Kenneth J McCullough, Wayne M Moreau, Charles J Taft: Topcoat process to prevent image collapse. International Business Machines Corporation, Connolly Bove Lodge & Hutz, December 2, 2003: US06656666 (11 worldwide citation)

The invention relates generally to photolithographic techniques, and particularly, but not by way of limitation, to a method for preventing the collapse of the image pattern during the stage of drying the image. The invention also relates to structures fabricated using the inventive method.



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