1
John C Helmer, Kwok F Lai, Robert L Anderson: Physical vapor deposition employing ion extraction from a plasma. Gerald Fisher, January 9, 1996: US05482611 (159 worldwide citation)

A sputter magnetron ion source for producing an intense plasma in a cathode container which ionizes a high and substantial percentage of the sputter cathode material and means for extracting the ions of the cathode material in a beam. The ion extraction means is implemented by a magnetic field cusp ...


2
Richard E Demaray, John C Helmer, Robert L Anderson, Young H Park, Ronald R Cochran, Vance E Hoffman Jr: Rotating sputtering apparatus for selected erosion. Varian Associates, October 12, 1993: US05252194 (103 worldwide citation)

A magnetron sputter source providing a predetermined erosion distribution over the surface of a sputter target material is described. When the distribution is uniform, close coupling of the sputter target with the substrate to be coated is achieved, resulting in improved collection efficiency of the ...


3
R Ernest Demaray, Vance E Hoffman, John C Helmer, Young H Park, Ronald R Cochran: Collimated deposition apparatus and method. Varian Associates, July 19, 1994: US05330628 (55 worldwide citation)

Sputtering apparatus and method which are particularly suitable for forming step coatings. A workpiece is supported in a chamber, particles are emitted from a sputter source in a substantially uniform manner throughout an area of greater lateral extent than the workpiece, the pressure within the cha ...


4
Robert L Anderson, John C Helmer: Sputtering apparatus with a rotating magnet array having a geometry for specified target erosion profile. Varian Associates, Stanley Z Cole, Sheri M Novack, February 26, 1991: US04995958 (48 worldwide citation)

A magnetron sputtering apparatus includes a rotatable magnet. At least a portion of the centerline of the magnet lies on a curve defined by ##EQU1## where .xi.(u) is a preselected erosion profile. When stationary, the magnet generates a localized magnetic field of approximately constant width. In op ...


5
Robert L Anderson, John C Helmer: Sputtering apparatus with a rotating magnet array having a geometry for specified target erosion profile. Novellus Systems, Roland Tso, February 15, 2000: US06024843 (29 worldwide citation)

A magentron sputtering apparatus includes a rotatable magnet which is either concave or convex. For one magnet structure, at least a portion of the centerline of the magnet lies along a curve defined by ##EQU1## where .xi.(r) is a preselected erosion profile. When stationary, the magnet generates a ...


6
Ahmad Abu Shumays, John C Helmer, Stephen J Luchetti: Single-pump multiple stroke proportioning for gradient elution liquid chromatography. Varian Associates, Stanley Z Cole, Gerald M Fisher, March 20, 1984: US04437812 (25 worldwide citation)

In a high-performance, high-pressure liquid chromatography system, gradient elution of solvent components from a plurality of component reservoirs can be accomplished according to a programmed temporally variable ratio by a single reciprocating pump. The pumping cycle comprises a plurality of fill s ...


7
John C Helmer: Magnetron sputter device having planar and curved targets. Varian Associates, Stanley Z Cole, Leon F Herbert, Kenneth L Warsh, August 19, 1986: US04606806 (19 worldwide citation)

A magnetron sputter device includes a first target having an emitting surface and a second target having a concave emitting target defined by a side wall of a frustum of cone. Separate plasma discharges for the targets are confined by separate electromagnet derived magnetic fields, coupled to the ta ...


8
Dean S Burgi, John C Helmer, Ring Ling Chien: Optical detection system for capillary separation columns. Varian Associates, August 10, 1993: US05235409 (19 worldwide citation)

On-column optical detection apparatus and method for use with capillary separation columns are shown. The apparatus and method minimize the adverse effects of light scattered from the walls of the column, thereby improving detection sensitivity and providing greater dynamic range. Light from a conve ...


9
R Ernest Demaray, Vance E Hoffman, John C Helmer, Young H Park, Ronald R Cochran: Collimated deposition apparatus and method. Varian Associates, June 3, 1997: US05635036 (17 worldwide citation)

Sputtering apparatus and method which are particularly suitable for forming step coatings. A workpiece is supported in a chamber, particles are emitted from a sputter source in a substantially uniform manner throughout an area of greater lateral extent than the workpiece, the pressure within the cha ...


10
John C Helmer, Kenneth J Doniger: Inverted re-entrant magnetron ion source. Varian Associates, Stanley Z Cole, Kenneth L Warsh, Peter J Sgarbossa, September 27, 1988: US04774437 (14 worldwide citation)

An ion source for an intense ion beam from a solid source is formed with a cathode around a central anode. A source of magnetic field with closely spaced poles is formed around a central region of the cathode so that the most intense region of the magnetic field is a torus on the inside of the catho ...