1
Johannes Cornelis Driessen, Hermanus Mathias Joannes Rene Soemers, Michael Jozefa Mathijs Renkens, Theodorus Hubertus Josephus Bisschops, Johannes Petrus Martinus Bernardus Vermeulen, Antonius Maria Rijken: Lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, May 25, 2004: US06740891 (13 worldwide citation)

A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are shielded from exposure to the vacuum by conduit conducts having at least the same number of degrees of freedo ...


2
Michel Riepen, Nicolaas Rudolf Kemper, Johannes Petrus Martinus Bernardus Vermeulen, Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Arnold Jan Van Putten: Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 1, 2013: US08345218 (8 worldwide citation)

An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning devic ...


3
Jan Van Eijk, Engelbertus Antonius Fransiscus Van Der Pasch, Johannes Petrus Martinus Bernardus Vermeulen: Positioning system, lithographic apparatus and method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 9, 2013: US08482719 (6 worldwide citation)

A positioning system to position a movable object having a body, the positioning system includes an object position measurement system, an object actuator, and an object controller, wherein the positioning system further includes a stiffener to increase the stiffness and/or to damp relative movement ...


4
Arie Jeffrey Den Boef, Andre Bernardus Jeunink, Johannes Petrus Martinus Bernardus Vermeulen, Pascal Antonius Smits, Sander Frederik Wuister, Yvonne Wendela Kruijt Stegeman, Catharinus De Schiffart: Imprint lithography. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, November 27, 2012: US08319968 (4 worldwide citation)

A method of determining a position of a substrate relative to an imprint template is described, wherein the imprint template has at least three gratings and the substrate has at least three gratings positioned such that each imprint template grating forms a composite grating with an associated subst ...


5
Sven Antoin Johan Hol, Johannes Petrus Martinus Bernardus Vermeulen, Wilhelmus Henricus Theodorus Maria Aangenent, George Wilhelmus Johannes Clijsen, Johannes Antonius Gerardus Akkermans, Jacob Kornelis Ter Veer, Jeroen De Boeij: Variable reluctance device, stage apparatus, lithographic apparatus and device manufacturing method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, July 14, 2015: US09081307 (2 worldwide citation)

A variable reluctance device includes first and second magnetic members, a coil, a measurement coil, and a control unit. The first and second magnetic members are displaceable relative to each other to provide a magnetic circuit having a variable reluctance. The coil for, in use, receiving a current ...


6
Yvonne Wendela Kruijt Stegeman, Andre Bernardus Jeunink, Johannes Petrus Martinus Bernardus Vermeulen: Imprint lithography method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, June 21, 2016: US09372396 (2 worldwide citation)

An imprint lithography apparatus and manufacturing method can lead to mechanical stress being formed in a substrate to which an imprint pattern is being applied. This may cause strain within the substrate leading to misalignment of a subsequent pattern with an earlier pattern in a part of the substr ...


7
Henricus Wilhelmus Aloysius Janssen, Johannes Petrus Martinus Bernardus Vermeulen, Fransiscus Marinus Andrea Maria Van Gaal, Petrus Carolus Maria Frissen: Band coil. Koninklijke Philips Electronics, Aaron Waxler, August 9, 2005: US06926588 (2 worldwide citation)

The invention relates to a method of manufacturing a band coil by means of a material-removing process performed on the coils so as to obtain a band coil which has a profile in the direction of the coil axis. Such a process may be a discharge process, an etching process or a mechanical grinding proc ...


8
Yvonne Wendela Kruijt Stegeman, Andre Bernardus Jeunink, Johannes Petrus Martinus Bernardus Vermeulen, Sander Frederik Wuister, Raymond Wilhelmus Louis Lafarre, Catharinus De Schiffart, Norbert Erwin Therenzo Jansen: Imprint lithography. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 25, 2011: US08043085 (2 worldwide citation)

An imprint lithography apparatus is disclosed that has a first support structure arranged to support an imprint template, and a first actuator attached to the first support structure, and arranged in use to be located between the first support structure and the imprint template. The first actuator i ...


9
Henricus Wilhelmus Aloysius Janssen, Johannes Petrus Martinus Bernardus Vermeulen, Fransiscus Marinus Andrea Maria Van Gaal, Petrus Carolus Maria Frissen: Band coil. Michael E Marion, US Philips Corporation, June 27, 2002: US20020079775-A1 (2 worldwide citation)

The invention relates to a method of manufacturing a band coil by means of a material-removing process performed on the coils so as to obtain a band coil which has a profile in the direction of the coil axis. Such a process may be a discharge process, an etching process or a mechanical grinding proc ...


10
Pieter Johannes Marius Van Groos, Jan Frederik Hoogkamp, Josephus Cornelius Johannes Antonius Vugts, Robert Gordon Livesey, Johannes Hendrikus Gertrudis Franssen, Albert Jan Hendrik Klomp, Johannes Petrus Martinus Bernardus Vermeulen, Erik Roelof Loopstra: Method and apparatus for maintaining a machine part. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, August 18, 2009: US07576831 (1 worldwide citation)

A method of and apparatus for maintaining a machine part arranged in an interior space of a machine, where the interior space is kept at a first pressure and is separated from an environment having a second pressure via a load lock. The method includes transporting a machine part via the load lock o ...