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Johannes Jacobus Matheus Baselmans, Marco Hugo Petrus Moers, Hans Van Der Laan, Robert Wilhelm Willekers, Wilhelmus Petrus De Boeij, Marcus Adrianus Van De Kerkhof: Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations. ASML Netherlands, Pillsbury Winthrop, November 18, 2003: US06650399 (92 worldwide citation)

A lithographic projection apparatus including an illumination system; a support structure for holding a mask; a substrate table for holding a substrate; a projection system for projecting a pattern onto a target portion of the substrate; and an interferometric measurement system for measuring wave f ...


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Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Hugo Augustinus Joseph Cramer, Jozef Maria Finders, Carsten Kohler: Lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, October 26, 2004: US06809797 (35 worldwide citation)

A device manufacturing method is disclosed in which the aberration of the projection system of a lithographic projection apparatus is obtained in terms of the Zernike expansion. The field distribution of displacement error and focal plane distortion of the projected image are calculated on the basis ...


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Johannes Catharinus Hubertus Mulkens, Johannes Jacobus Matheus Baselmans, Paul Graupner, Erik Roelof Loopstra, Bob Streefkerk: Lithographic apparatus and device manufacturing method. ASML Netherlands, Carl Zeiss SMT, Pillsbury Winthrop Shaw Pittman, October 7, 2008: US07433015 (34 worldwide citation)

An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tune ...


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Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Paul Graupner, Jan Haisma, Nicodemus Hattu, Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Bernard Gellrich: Lithographic apparatus and device manufacturing method. ASML Netherlands, Carl Zeiss SMT, Pillsbury Winthrop Shaw Pittman, June 9, 2009: US07545481 (27 worldwide citation)

The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation ...


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Markus Franciscus Antonius Eurlings, Johannes Jacobus Matheus Baselmans, Hako Botma, Jan Bruining, Marcel Mathijs Theodore Marie Dierichs, Antonius Johannes Josephus Van Dijsseldonk, Judocus Marie Dominicus Stoeldraijer: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 12, 2006: US07148952 (20 worldwide citation)

The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (7), such that a projection beam of radiation (4) can be shifted around a central position. T ...


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Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 5, 2009: US07528929 (19 worldwide citation)

An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liqu ...