1
Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Marco Koert Stavenga, Bob Streefkerk, Martinus Cornelis Maria Verhagen, Lejla Seuntiens Gruda: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, June 8, 2010: US07733459 (31 worldwide citation)

In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter con ...


2
Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Frits Van der Meulen, Joost Jeroen Ottens, Anko Jozef Cornelus Sijben, Wouterus Johannes Petrus Maria Maas, Hendrikus Johannes Marinus Van Abeelen, Henricus Petrus Versteijnen, Paula Steffens: Lithographic apparatus and method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 22, 2013: US08564763 (19 worldwide citation)

A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.


3
Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Franciscus Johannes Joseph Janssen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 26, 2010: US07652746 (11 worldwide citation)

Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation ...


4
Nicolaas Ten Kate, Johannes Henricus Wilhelmus Jacobs: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 31, 2007: US07251013 (11 worldwide citation)

In an immersion lithography apparatus in which, for example, immersion liquid is supplied to a localized space, a plate is provided to divide the space into two parts. Such a division of the space may facilitate reduction of stray radiation, a temperature gradient, and the transportation of contamin ...


5

6
Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 12, 2008: US07411654 (9 worldwide citation)

A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibr ...


7
Johannes Henricus Wilhelmus Jacobs, Igor Petrus Maria Bouchoms, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Joost Jeroen Ottens, Martinus Cornelis Maria Verhagen, Yücel Kök, Johannes Van Es, Herman Boom, Franciscus Johannes Joseph Janssen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 6, 2010: US07751027 (9 worldwide citation)

Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation ...


8
Joost Jeroen Ottens, Johannes Henricus Wilhelmus Jacobs, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders: Lithographic apparatus and substrate edge seal. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 2, 2008: US07420194 (6 worldwide citation)

A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from th ...


9
Marcel Beckers, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Ferdy Migchelbrink: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 12, 2008: US07411658 (5 worldwide citation)

A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projecti ...


10
Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Marco Koert Stavenga, Bob Streefkerk, Martinus Cornelis Maria Verhagen, Lejla Seuntiens Gruda: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 14, 2014: US08629971 (4 worldwide citation)

In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter con ...