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Johannes C M Jasper, Erik R Loopstra, Theodorus M Modderman, Gerrit J Nijmeijer, Nicolaas A A J van Asten, Frederik T E Heuts, Jacobus Gemen, Richard J H Du Croo de Jongh, Marcus E J Boonman, Jacob F F Klinkhamer, Thomas J M Castenmiller: Off-axis levelling in lithographic projection apparatus. ASML Netherlands, Pillsbury Winthrop, January 6, 2004: US06674510 (94 worldwide citation)

In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure ...


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Johannes C M Jasper, Erik R Loopstra, Theodorus M Modderman, Gerrit J Nijmeijer, Nicolaas A A J van Asten, Frederik T E Heuts, Jacobus Gemen, Richard J H Du Croo de Jongh, Marcus E J Boonman, Jacob F F Klinkhamer, Thomas J M Castenmiller: Off-axis leveling in lithographic projection apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 28, 2006: US07019815 (10 worldwide citation)

In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure ...


3
Johannes C H Mulkens, Marinus A Van Den Brink, Johannes C M Jasper: Photolithographic apparatus. ASM Lithography, Pillsbury Madison & Sutro, May 23, 2000: US06067146 (5 worldwide citation)

Photolithographic apparatus (1) including an illumination unit (3). The illumination unit (3) comprises, in this order, a radiation source unit (11), a first optical system (5) and an optical waveguide (17). The apparatus (1) further includes a second optical system (7) and a mask table (9). The app ...


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Johannes C M Jasper, Alexander Straaijer: Scanning-slit exposure device. ASM Lithography, Pillsbury Madison & Sutro Intellectual Property Group, March 30, 1999: US05889580 (1 worldwide citation)

A scanning-slit exposure device is provided with a radiation source (1) emitting radiation pulses through an exit window (2). An imaging system (3) images the exit window onto a surface (4) to be exposed by the radiation. The surface is scanned relative to the exit window image in a scan direction. ...