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Antoine Gaston Marie Kiers, Johannes Anna Quaedackers: Device manufacturing method and computer program product. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 29, 2009: US07596420 (4 worldwide citation)

A method is provided wherein a lithographic projection apparatus is used to print a series of test patterns on a test substrate to measure printed critical dimension as function of exposure dose setting and focus setting. A full-substrate analysis of measured critical dimension data is modeled by a ...


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Eddy Cornelis Antonius Van Der Heijden, Johannes Anna Quaedackers, Dorothea Maria Christina Oorschot, Hieronymus Johannus Christiaan Meessen, Yin Fong Choi: Overlay measurement on double patterning substrate. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, August 2, 2011: US07992115 (3 worldwide citation)

A method of measuring overlay between a first structure and a second structure on a substrate is provided. The structures include equidistant elements, such as parallel lines, wherein the equidistant elements of the first and second structure alternate. A design width CD1 of the elements of the firs ...


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Jozef Maria Finders, Johannes Anna Quaedackers, Judocus Marie Dominicus Stoeldraijer, Johannes Wilhelmus De Klerk, Alexander Serebryakov: Method for exposing a substrate and lithographic projection apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 2, 2010: US07670731 (3 worldwide citation)

A method for improving the uniformity of a lithographic process. In one aspect, the probability density function of a first and second lithographic apparatus are matched by providing a continuous z-motion to a stage in the first lithographic apparatus during substrate exposure. Preferably, the z-mot ...


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Henricus Johannes Lambertus Megens, Johannes Anna Quaedackers, Christian Marinus Leewis, Peter Clement Paul Vanoppen: Method of determining a characteristic. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, August 6, 2013: US08502955 (1 worldwide citation)

A plurality of targets including a second population superimposed on a first population are formed. In the first target the second population has an asymmetry with respect to the first population. In the second target the second population has a different asymmetry with respect to the first populati ...


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Johannes Anna Quaedackers, Koen Van Ingen Schenau, Patrick Wong, Michel Franciscus Johannes Van Rooy: Lithographic apparatus, device manufacturing method and substrate. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 11, 2007: US07307687 (1 worldwide citation)

An immersion lithographic apparatus provides an immersion liquid including photosensitive material(s) configured to form a patterned film on the surface of a substrate on exposure to a radiation beam. Irradiation through the immersion liquid onto a substrate leads to deposition of a film on the subs ...


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Rik Teodoor Vangheluwe, Youri Johannes Laurentius Maria Van Dommelen, Johannes Anna Quaedackers, Cédric Désiré Grouwstra, Thijs Egidius Johannes Knaapen, Ralf Martinus Marinus Daverveld, Jeroen Hubert Rommers: Method of inspecting a substrate and method of preparing a substrate for lithography. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 7, 2013: US08435593

A method of inspecting a substrate with first and second layers thereon is disclosed. The method includes directing a beam of electromagnetic radiation at an acute angle towards an edge of the layers, detecting scattered and/or reflected electromagnetic radiation, and establishing, from results of t ...


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Eddy Cornelis Antonius Van Der Heijden, Johannes Anna Quaedackers, Dorothea Maria Christina Oorschot, Hieronymus Johannus Christiaan Meessen, Yin Fong Choi: Lithographic method. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, February 21, 2012: US08119333

A method for providing a pattern on a substrate is disclosed. The method includes providing a first pattern in a first layer of photoresist and a first layer of bottom anti-reflective coating material on the substrate, etching the first pattern into the substrate, providing a second layer of photore ...