1
Richard Edmond Bockrath, Daniel Campos, Jo Ann Theresa Schwartz, Richard Thomas Stimek: Method and Ru,Re,Sn/carbon catalyst for hydrogenation in aqueous solution. E I du Pont de Nemours and Company, December 28, 1999: US06008384 (22 worldwide citation)

An improved two step (dual stage catalysis) aqueous hydrogenation process and a novel trimetallic hydrogenation catalysts consisting essentially of highly dispersed, reduced ruthenium and rhenium metals in the presence of a third metal tin on carbon support particular useful in the second stage of t ...


2
Jo Ann Theresa Schwartz: Process for manufacture of an attrition resistant catalyst. E I du Pont de Nemours and Company, March 26, 2002: US06362128 (4 worldwide citation)

A method for manufacturing of an improved attrition resistant catalyst having an oxide-rich surface layer involving forming an aqueous slurry comprising; catalyst, catalyst precursor or catalyst support particles (e.g., vanadium/phosphorus oxide, V/P/O catalyst), a large particle colloidal oxide sol ...


3
Xiaobo Shi, John Edward Quincy Hughes, Hongjun Zhou, Daniel Hernandez Castillo II, Jae Ouk Choo, James Allen Schlueter, Jo Ann Theresa Schwartz, Laura Ledenbach, Steven Charles Winchester, Saifi Usmani, John Anthony Marsella, Martin Kamau Ngigi Mungai: Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof. VERSUM MATERIALS US, Lina Yang, July 3, 2018: US10011741

Methods for removing, reducing or treating the trace metal contaminants and the smaller fine sized cerium oxide particles from cerium oxide particles, cerium oxide slurry or chemical mechanical polishing (CMP) compositions for Shallow Trench Isolation (STI) process are applied. The treated chemical ...


4
Xiaobo Shi, John Edward Quincy Hughes, Hongjun Zhou, Daniel Hernandez Castillo II, Jae Ouk Choo, James Allen Schlueter, Jo Ann Theresa Schwartz, Laura Ledenbach, Steven Charles Winchester, Saifi Usmani, John Anthony Marsella, Martin Kamau Ngigi Mungai: Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof. Air Products and Chemicals, Lina Yang, April 5, 2016: US09305476

Methods for removing, reducing or treating the trace metal contaminants and the smaller fine sized cerium oxide particles from cerium oxide particles, cerium oxide slurry or chemical mechanical polishing (CMP) compositions for Shallow Trench Isolation (STI) process are applied. The treated chemical ...


5
Xiaobo Shi, John Edward Quincy Hughes, Hongjun Zhou, Daniel Hernandez Castillo II, Jae Ouk Choo, James Allen Schlueter, Jo Ann Theresa Schwartz, Laura Ledenbach, Steve Charles Winchester, Saifi Usmani, John Anthony Marsella, Martin Kamau Ngigi Mungai: Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof. Air Products and Chemicals, Lina Yang, June 23, 2015: US09062230

Methods for removing, reducing or treating the trace metal contaminants and the smaller fine sized cerium oxide particles from cerium oxide particles, cerium oxide slurry or chemical mechanical polishing (CMP) compositions for Shallow Trench Isolation (STI) process are applied. The treated chemical ...


6
Hongjun Zhou, Xiaobo Shi, Jo Ann Theresa Schwartz: Metal compound chemically anchored colloidal particles and methods of production and use thereof. Versum Materials US, Lina Yang, December 25, 2018: US10160884

Metal compound chemically anchored colloidal particles wherein the metal compound is in molecular form are disclosed. A facile and fast process to chemically anchor metal compounds uniformly onto colloidal particle surfaces via chemical bonding has been developed. Metal compounds are chemically anch ...


7
Xiaobo Shi, John Edward Quincy Hughes, Hongjun Zhou, Daniel Hernandez Castillo II, Jae Ouk Choo, James Allen Schlueter, Jo Ann Theresa Schwartz, Laura Ledenbach, Steve Charles Winchester, Saifi Usmani, John Anthony Marsella, Martin Kamau Ngigi Mungai: Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof. Air Products and Chemicals, Lina Yang, October 14, 2014: US08859428

Methods for removing, reducing or treating the trace metal contaminants and the smaller fine sized cerium oxide particles from cerium oxide particles, cerium oxide slurry or chemical mechanical polishing (CMP) compositions for Shallow Trench Isolation (STI) process are applied. The treated chemical ...


8
Hongjun Zhou, Jo Ann Theresa Schwartz, Malcolm Grief, Xiaobo Shi, Krishna P Murella, Steven Charles Winchester, John Edward Quincy Hughes, Mark Leonard O Neill, Andrew J Dodd, Dnyanesh Chandrakant Tamboli, Reinaldo Mario Machado: Composite abrasive particles for chemical mechanical planarization composition and method of use thereof. VERSUM MATERIALS US, Lina Yang, October 23, 2018: US10109493

Chemical Mechanical Planarization (CMP) polishing compositions comprising composite particles, such as ceria coated silica particles, offer low dishing, low defects, and high removal rate for polishing oxide films. Chemical Mechanical Planarization (CMP) polishing compositions have shown excellent p ...


9
Jo Ann Theresa Schwartz, Lawrence Wayne Gosser: Hydrogen peroxide production method using platinum/palladium catalysts. Ei Du Pont de Nemours And Co, QI ZENGDU, December 13, 1989: CN89104296

An improved method for making hydrogen peroxide from the direct combination of hydrogen and oxygen using a platinum/palladium catalyst in which the weight ratio of platinum to platinum plus palladium is in the range of about 0.02 to about 0.2.