1
Wayne T McDermott, Richard C Ockovic, Jin J Wu, Douglas W Cooper, Alexander Schwarz, Henry L Wolfe: Surface cleaning using a cryogenic aerosol. Air Products and Chemicals, International Business Machines Corporation, Geoffrey L Chase, James C Simmons, William F Marsh, November 5, 1991: US05062898 (175 worldwide citation)

A method is disclosed for cleaning microelectronics surfaces using an aerosol of at least substantially solid argon particles which impinge upon the surface to be cleaned and then evaporate and the resulting gas is removed by venting along with the contaminants dislodged by the cleaning method.


2
Wayne T McDermott, Richard C Ockovic, Jin J Wu, Douglas W Cooper, Alexander Schwarz, Henry L Wolfe: Surface cleaning using an argon or nitrogen aerosol. Air Products and Chemicals, International Business Machines Corporation, Geoffrey L Chase, James C Simmons, William F Marsh, March 15, 1994: US05294261 (168 worldwide citation)

A method is disclosed for cleaning microelectronic surfaces using an aerosol of at least substantially solid argon or nitrogen particles which impinge upon the surface to be cleaned and then evaporate and the resulting gas is removed by venting along with the contaminants dislodged by the cleaning m ...


3
Wayne T McDermott, Jin J Wu, Richard C Ockovic: Apparatus to clean solid surfaces using a cryogenic aerosol. Air Products and Chemicals, International Business Machines Corporation, Geoffrey L Chase, James C Simmons, William F Marsh, May 11, 1993: US05209028 (167 worldwide citation)

The present invention is an apparatus for cleaning semi-conductor solid surfaces using a spray of frozen cryogen, such as argon, to impinge on the solid surface to remove contaminant particles. The apparatus includes an appropriate nozzle positioned in a housing designed for ultra clean conditions i ...


4
George G Gifford, Yeong Jyh T Lii, Jin J Wu: Process for fabricating a semiconductor structure having sidewalls. International Business Machines Corporation, Richard Lau, January 3, 1995: US05378312 (58 worldwide citation)

A method of fabricating a semiconductor structure includes the steps of providing a semiconductor substrate having a material disposed thereon, masking the material with a mask having an appropriate pattern for forming a semiconductor structure, etching unmasked portions of the material so as to for ...


5
Richard C Flagan, Jin J Wu: Aerosol reactor production of uniform submicron powders. California Institute of Technology, Antonio M Fernandez, February 19, 1991: US04994107 (32 worldwide citation)

A method of producing submicron nonagglomerated particles in a single stage reactor includes introducing a reactant or mixture of reactants at one end while varying the temperature along the reactor to initiate reactions at a low rate. As homogeneously small numbers of seed particles generated in th ...


6
Kris V Srikrishnan, Jin J Wu: Aerosol cleaning method. International Business Machines Corporation, Richard Lau, December 13, 1994: US05372652 (27 worldwide citation)

An aerosol cleaning apparatus for cleaning a substrate includes an aerosol producing means having a nozzle head. The nozzle head is positioned at a selected proximity and orientation to the substrate which is held by a rotatable holder. The aerosol spray dislodges particles from the substrate and th ...


7
Tibor L Bauer, William A Cavaliere, David C Linnell, Jin J Wu: Nozzle apparatus for producing aerosol. International Business Machines Corporation, Richard Lau, November 22, 1994: US05366156 (16 worldwide citation)

A nozzle apparatus for producing aerosol from a substance includes a delivery line having an inlet for receiving the substance at a first pressure. A nozzle is connected to the delivery line for receiving the substance from the delivery line. The nozzle has at least one exit opening which allows pas ...


8
Tibor L Bauer, William A Cavaliere, Charles R Dart II, Timothy H Freebern, David C Linnell, James M Miller, Jin J Wu: Apparatus for producing cryogenic aerosol. International Business Machines Corporation, Richard Lau, January 3, 1995: US05377911 (8 worldwide citation)

An apparatus for producing aerosol from a substance includes a heat exchanger for receiving and cooling a substance. The heat exchanger includes a housing; a cryogenic reservoir comprising a solid material mounted within the housing; temperature control means for controllably cooling the reservoir; ...


9
William A Cavaliere, Robert P Kuder II, Jin J Wu: Mounting apparatus for cryogenic aerosol cleaning. International Business Machines Corporation, Dale M Crockatt, Richard Lau, January 23, 1996: US05486132 (7 worldwide citation)

An apparatus for mounting to a tool having a surface to be cleaned for producing aerosol from a substance for cleaning the surface, includes a flange for mounting to the tool having the surface to be cleaned. A nozzle is mounted to the flange for receiving the substance. The nozzle has at least one ...


10
Tibor L Bauer, William A Cavaliere, Charles R Dart II, Timothy H Freebern, David C Linnell, James M Miller, Jin J Wu: Heat exchanger. International Business Machines Corporation, Richard Lau, March 28, 1995: US05400603 (6 worldwide citation)

A heat exchanger includes a housing, a reservoir comprising a solid material mounted within the housing, temperature control means for controlling the temperature of the reservoir, and energy exchange means for allowing thermal contact between the reservoir and a substance for effectuating transfer ...