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Dr. Jill S. Becker
Roy G Gordon, Jill S Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale & Dorr, March 24, 2009: US07507848 (9 worldwide citation)

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


2
Dr. Jill S. Becker
Douwe J Monsma, Jill S Becker: Vapor deposition systems and methods. Cambridge NanoTech, The Marbury Law Group PLLC, June 19, 2012: US08202575 (8 worldwide citation)

Vapor deposition systems and methods associated with the same are provided. The systems may be designed to include features that can promote high quality deposition; simplify manufacture, modification and use; as well as, reduce the footprint of the system, amongst other advantages.


3
Dr. Jill S. Becker
Roy G Gordon, Jill S Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, December 18, 2012: US08334016 (1 worldwide citation)

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


4
Dr. Jill S. Becker
Roy Gerald Gordon, Jill S Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, September 17, 2013: US08536070

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


5
Dr. Jill S. Becker
Jill S Becker, Roger R Coutu, Douwe J Monsma: System and method for thin film deposition. Cambridge NanoTech, Wolf Greenfield & Sacks PC, July 1, 2010: US20100166955-A1

A reaction chamber assembly suitable for forming thin film deposition layers onto solid substrates includes a reaction chamber and an input plenum for receiving source material from gas source containers and delivering a flow of source material into the reaction chamber uniformly distributed across ...


6
Dr. Jill S. Becker
Jill S Becker, Roger R Coutu, Douwe J Monsma: Plasma atomic layer deposition system and method. Cambridge NanoTech, Wolf Greenfield & Sacks PC, July 22, 2010: US20100183825-A1

An improved gas deposition chamber includes a hollow gas deposition volume formed with a volume expanding top portion and a substantially constant volume cylindrical middle portion. The hollow gas deposition volume may include a volume reducing lower portion. An aerodynamically shaped substrate supp ...


7
Dr. Jill S. Becker
Roger R Coutu, Jill S Becker, Douwe J Monsma: Reaction chamber with removable liner. Cambridge NanoTech, Wolf Greenfield & Sacks PC, September 30, 2010: US20100247763-A1

A reaction chamber assembly for thin film deposition processes or the like includes an outer wall assembly for enclosing an outer volume and a removable liner installed into the outer volume through an outer aperture for preventing precursors or reactants from coming into contact with internal surfa ...


8
Dr. Jill S. Becker
Douwe J Monsma, Jill S Becker: Vapor deposition systems and methods. Cambridge NanoTech, Wolf Greenfield & Sacks PC, Federal Reserve Plaza, February 2, 2006: US20060021573-A1

Vapor deposition systems and methods associated with the same are provided. The systems may be designed to include features that can promote high quality deposition; simplify manufacture, modification and use; as well as, reduce the footprint of the system, amongst other advantages.


9
Roy Gerald Gordon, Jill S Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Clark & Elbing, February 27, 2018: US09905414

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido) hafnium to deposit h ...


10
Roger R Coutu, Jill S Becker, Douwe J Monsma: Reaction chamber with removable liner. Ultratech, Allston L Jones, Peters Verny, November 3, 2015: US09175388

A reaction chamber assembly for thin film deposition processes or the like includes an outer wall assembly for enclosing an outer volume and a removable liner installed into the outer volume through an outer aperture for preventing precursors or reactants from coming into contact with internal surfa ...