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Sander Frederik Wuister, Johan Frederik Dijksman, Yvonne Wendela Kruijt Stegeman, Ivar Schram, Jeroen Herman Lammers, Richard Joseph Marinus Schroeders: Imprint lithography. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 27, 2012: US08144309 (1 worldwide citation)

A chuck apparatus for holding a substrate is the disclosed. The chuck apparatus includes a first surface portion on which the substrate is to be held and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and wh ...


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Paul Van Der Sluis, Alwin Rogier Martijn Verschueren, Markus Hijlkema, Jeroen Herman Lammers: Nebulizer, a control unit for controlling the same, a nebulizing element and a method of operating a nebulizer. KONINKLIJKE PHILIPS, Michael W Haas, February 21, 2017: US09572944 (1 worldwide citation)

There is provided a control unit for controlling the operation of a nebulizer, the nebulizer comprising a reservoir chamber for storing a liquid to be nebulised, an actuator, and a nebulizing element comprising a plurality of nozzles arranged to nebulize the liquid upon operation of the actuator; wh ...


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Martinus Bernardus Van Der Mark, Alphonsus Tarcisius Jozef Maria Schipper, Jeroen Herman Lammers, Alwin Rogier Martijn Verschueren, Henri Marie Joseph Boots, Petrus Henricus Cornelius Bentvelsen, Hendrik Huijgen, Paul Van Der Sluis: Analysis and control of aerosol flow. KONINKLIJKE PHILIPS, Michael W Haas, March 21, 2017: US09599550 (1 worldwide citation)

An aerosol generation system has a light source arrangement which provides signals at first and second wavelengths, and the detected light signals are recorded. The detected signals are processed to derive at least a measure of the aerosol particle size. This can be used in combination with the othe ...


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Gerben Kooijman, Jan Frederik Suijver, Yvonne Wendela Kruijt Stegeman, Jeroen Herman Lammers: Vacuum cleaning device, comprising a unit with a movable surface for generating an oscillating airflow. Koninklijke Philips, October 14, 2014: US08857013 (1 worldwide citation)

A vacuum cleaning device comprises a unit (1) in which an oscillating airflow is generated which substantially zero net flow and an asymmetry between the suction and the blowing phases, such that in the blowing phase a jet is generated. A generator (31) which is needed for generating the oscillating ...


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Ivar Schram, Johan Frederik Dijksman, Sander Frederik Wuister, Yvonne Wendela Kruijt Stegeman, Jeroen Herman Lammers, Richard Joseph Marinus Schroeders: Imprint lithography. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 4, 2012: US08323541

A chuck apparatus for holding a substrate is the disclosed. The chuck apparatus includes a first surface portion on which the substrate is to be held and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and wh ...


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Ivar Schram, Johan Frederik Dijksman, Sander Frederik Wuister, Yvonne Wendela Kruijt Stegeman, Jeroen Herman Lammers, Richard Joseph Marinus Schroeders: Lithography meandering order. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 21, 2010: US07854877

An imprint lithography method is disclosed, which includes imprinting a plurality of patterns in an imprintable medium provided on a substrate, wherein the order in which the patterns are imprinted in the imprintable medium is such that, for the majority of the patterns, two consecutively imprinted ...


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Ivar Schram, Johan Frederik Dijksman, Sander Frederik Wuister, Yvonne Wendela Kruijt Stegeman, Jeroen Herman Lammers: Imprint lithography. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, May 30, 2017: US09662678

A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction acros ...


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Sander Frederik Wuister, Johan Frederik Dijksman, Yvonne Wendela Kruijt Stegeman, Jeroen Herman Lammers, Leendert Van Der Tempel: Imprint lithography method and apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 15, 2014: US08696969

An imprint lithography method is provided. The method includes undertaking first and second imprints, which comprises for each imprint: for an area of a substrate provided with a plurality of drops of imprintable medium in respectively first and second configurations, imprinting a pattern in the imp ...


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Ivar Schram, Johan Frederik Dijksman, Sander Frederik Wuister, Yvonne Wendela Kruijt Stegeman, Jeroen Herman Lammers: Imprint lithography. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 29, 2014: US08707890

A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction acros ...