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Jan Gerard Cornelis Van Der Toorn, Christiaan Alexander Hoogendam: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 10, 2006: US07119876 (63 worldwide citation)

To facilitate, for example, removal of a substrate between exposures of different substrates, an actuated closing plate is used to replace a substrate, a substrate table, or both, as a part of a boundary of a space in a lithographic apparatus containing liquid without, for example, breaking a seal c ...


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Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Jan Gerard Cornelis Van Der Toorn: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 31, 2012: US08233135 (18 worldwide citation)

A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a substrate supported by a substrate table; a liquid supply system configured to supply a space between the projection system and the substrate with a liquid; a closing surface configured to p ...


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Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Jan Gerard Cornelis Van Der Toorn: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 22, 2008: US07403261 (8 worldwide citation)

The present invention relates to the method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid su ...


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Henrikus Herman Marie Cox, Petrus Marinus Christianus Maria Van Den Biggelaar, Frits Van Der Meulen, Franciscus Andreas Cornelis Johannes Spanjers, Jan Gerard Cornelis Van Der Toorn, Arend Jan Migchelbrink: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, November 13, 2007: US07295283 (8 worldwide citation)

A lithographic apparatus for immersion lithography is described in which a compensation controller controls actuators to apply forces to the substrate equal in magnitude and opposite in direction to forces which are applied to the substrate by a liquid supply system which supplies liquid between the ...


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Roelof Frederik De Graaf, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan Gerard Cornelis Van Der Toorn, Michel Riepen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 23, 2008: US07468779 (7 worldwide citation)

A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liq ...