1
Conor Patrick O&apos Carroll, Rudy Santo Tomas Cardema, James Tsuneo Taoka, Zion Koren: Windows used in thermal processing chambers. Mattson Technology, Dority & Manning P A, May 6, 2003: US06559424 (46 worldwide citation)

An apparatus for heat treating semiconductor wafers in a thermal processing chamber using light energy is provided. In one embodiment, the apparatus contains a window located between the semiconductor wafer and the energy source. The window contains a member that defines at least one passage capable ...


2
Zion Koren, Conor Patrick O Carroll, Shuen Chun Choy, Paul Janis Timans, Rudy Santo Tomas Cardema, James Tsuneo Taoka, Arieh A Strod: Heating configuration for use in thermal processing chambers. Mattson Technology, Dority & Manning P A, November 29, 2005: US06970644 (25 worldwide citation)

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the present invention, tuning devices ...


3
Zion Koren, Yorkman Ma, Rudy Santo Tomas Cardema, James Tsuneo Taoka, Lois Wride, Craig McFarland, Shawn Gibson: Method and system for rotating a semiconductor wafer in processing chambers. Mattson Technology, Dority & Manning P A, August 3, 2004: US06770146 (22 worldwide citation)

The present invention is generally directed to a system and process for rotating semiconductor wafers in thermal processing chambers, such as rapid thermal processing chambers and chemical vapor deposition chambers. In accordance with the present invention, a semiconductor wafer is supported on a su ...


4
Zion Koren, Conor Patrick O Carroll, Shuen Chun Choy, Paul Janis Timans, Rudy Santo Tomas Cardema, James Tsuneo Taoka, Arieh A Strod: Heating configuration for use in thermal processing chambers. Mattson Technology, Dority & Manning P A, September 11, 2007: US07269343 (17 worldwide citation)

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the present invention, tuning devices ...


5
Zion Koren, Conor Patrick O Carroll, Shuen Chun Choy, Paul Janis Timans, Rudy Santo Tomas Cardema, James Tsuneo Taoka, Arieh A Strod: Heating configuration for use in thermal processing chambers. Mattson Technology, Dority & Manning P A, May 24, 2011: US07949237 (7 worldwide citation)

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the present invention, tuning devices ...


6
Conor Patrick O Carroll, Rudy Santo Tomas Cardema, James Tsuneo Taoka, Zion Koren: Windows used in thermal processing chambers. Jason W Johnston Dority & Manning P A, July 4, 2002: US20020084424-A1

An apparatus for heat treating semiconductor wafers in a thermal processing chamber using light energy is provided. In one embodiment, the apparatus contains a window located between the semiconductor wafer and the energy source. The window contains a member that defines at least one passage capable ...


7
Zion Koren, Conor Patrick O Carroll, Shuen Chun Choy, Paul Janis Timans, Rudy Santo Tomas Cardena, James Tsuneo Taoka, Arieh A Strod: Heating configuration for use in thermal processing chambers. Mattson Technology, Timothy A Cassidy, Dority & Manning Pa, January 29, 2004: US20040018008-A1

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the present invention, tuning devices ...


8
Zion Koren, Conor Patrick O Carroll, Shuen Chun Choy, Paul Janis Timans, Rudy Santo Tomas Cardema, James Tsuneo Taoka, Arieh A Strod: Heating Configuration for Use in Thermal Processing Chambers. Dority & Manning Pa, December 27, 2007: US20070297775-A1

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the present invention, tuning devices ...


9
Zion Koren, Yorkman Ma, Rudy Santo Tomas Cardema, James Tsuneo Taoka, Lois Wride, Craig McFarland, Shawn Gibson: Method and system for rotating a semiconductor wafer in processing chambers. Timothy A Cassidy, Dority & Manning Pa, August 8, 2002: US20020104619-A1

The present invention is generally directed to a system and process for rotating semiconductor wafers in thermal processing chambers, such as rapid thermal processing chambers and chemical vapor deposition chambers. In accordance with the present invention, a semiconductor wafer is supported on a su ...


10
Zion Koren, Conor Patrick O Carroll, Shuen Chun Choy, Paul Janis Timans, Rudy Santo Tomas Cardema, James Tsuneo Taoka, Arieh A Strod: Heating configuration for use in thermal processing chambers. Dority & Manning Pa, September 29, 2005: US20050213949-A1

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the present invention, tuning devices ...