Akira Kurusu, Nobuji Kishimoto, Isao Nakamura, Etsushige Matsunami: Method for the preparation of (meth)acrylonitriles. Nippon Shokubai, Sherman and Shalloway, December 1, 1998: US05844112

A method for the preparation of (meth)acrylonitriles following ammoxidation process comprising catalytically oxidizing at least one saturated hydrocarbon selected from the group consisting of propane and isobutane with a mixed gas containing mole-cular oxygen and ammonia in the presence of a catalys ...



Isao Nakamura, Yoichiro Emori, Hiroshi Watanabe: Filtration-type mold and mehtod for producing ceramic sintered body using the mold. Mitsui Kinzoku Kogyo, liu yuanjin, September 22, 1999: CN99100765

The present invention provides a filtration-type mold and method for producing ceramic sintered body using the mold. Said filtration-type mold made of non-hydrosoluble materials is used for obtaining a molding body by vacuum-draining water in slurry, characterized in that, said mold consists of the ...


Kenichi Fukui, Mitsuru Hiraki, Takayasu Ito, Isao Nakamura: Semiconductor integrated circuit device. Antonelli Terry Stout & Kraus, August 12, 2004: US20040155636-A1

There is provided a semiconductor integrated circuit device which assures high performance and low power consumption through reduction of installation area and realizes automatic voltage adjustment of a couple of voltage step-down power supply circuits for active and standby conditions. In this semi ...

Tadashi Onishi, Isao Nakamura, Chiharu Takimoto: Laminated glass. Central Glass Company, Crowell & Moring, February 1, 2007: US20070026210-A1

The present invention relates to a laminated glass having an interlayer film between at least two transparent glass platy bodies. Functional ultra-fine particles of a particle diameter of not greater than 0.2 μm are dispersed in the interlayer film. The functional ultra-fine particles comprise a sin ...

Naoki Yamamori, Isao Nakamura, Akio Harada: Low friction resistance coating film in water and the method of reducing the friction on a substrate in water. Jordan And Hamburg, October 2, 2003: US20030183125-A1

The present invention has for its object to provide a low friction resistance coating film in water, which is capable of reducing the frictional resistance in the part of a ship or a piping where frictions with fluids such as water may take place. The present invention is directed to a low friction ...

Toshihiro Tanaka, Yutaka Shinagawa, Masahiko Kimura, Isao Nakamura: Semiconductor integrated circuit and a method of testing the same. Hitachi, Miles & Stockbridge PC, October 24, 2002: US20020153917-A1

A semiconductor integrated circuit (LSI) in which control information for determining a voltage or a width of a pulse produced itself can easily be set in parallel with other LSIs, and set information can be corrected easily. From an external evaluation device, a voltage of an expected value is supp ...

Yasuyuki Kii, Isao Nakamura: Three dimensional image rendering apparatus and three dimensional image rendering method. Sharp Kabushiki Kaisha, Nixon & Vanderhye PC, May 19, 2005: US20050104893-A1

A three dimensional image rendering apparatus for rendering polygons forming a three dimensional object on a two dimensional display screen, comprising: a hidden surface removal section for performing a hidden surface removal process by, when a part or all of the pixels forming the two dimensional d ...