1
Ronald L Gordon, Ioana C Graur, Lars W Liebmann: Pliant SRAF for improved performance and manufacturability. International Business Machines Corporation, Todd M C Li, Hoffman Warnick & D Alessandro, October 3, 2006: US07115343 (147 worldwide citation)

A method for increasing coverage of subresolution assist features (SRAFs) in a layout. A set of possible SRAF placement and sizing rules for a given pitch is provided, ranked according to some figure of merit. During SRAF placement, the fit of a plurality of different SRAF solutions is successively ...


2
Lars W Liebmann, Ioana C Graur, Young O Kim, Mark A Lavin, Alfred K Wong: Phase shifted mask design system, phase shifted mask and VLSI circuit devices manufactured therewith. International Business Machines Corporation, Pollock Vande Sande & Amernick, May 2, 2000: US06057063 (50 worldwide citation)

A process for creating and verifying a design of phase-shifted masks utilizing at least one phase shift region employing a computer-aided design system. A chip design is provided. A phase-shift mask design capable of producing the chip design is created. Features in a design of the phase-shifted mas ...


3
Gerald Galan, Ioana C Graur, Lars W Liebmann: Phase shifted design verification routine. International Business Machines Corporation, H Daniel Schnurmann, Whitham Curtis & Whitham, July 13, 1999: US05923566 (49 worldwide citation)

A computer-implemented routine that verifies that an existing chip design can be converted to a PSM or reports localized design conflicts based solely on a knowledge of the specific design constraints applied in the targeted PSM design system and without a prior knowledge of specific layout configur ...


4
Lars W Liebmann, James A Culp, Ioana C Graur, Maharaj Mukherjee: Method for verification of resolution enhancement techniques and optical proximity correction in lithography. International Business Machines Corporation, Lisa U Jaklitsch, Cantor Colburn, February 7, 2006: US06996797 (12 worldwide citation)

A method for model-based verification of resolution enhancement techniques (RET) and optical proximity correction (OPC) in lithography includes scaling shapes of a drawn mask layout to their corresponding intended wafer dimensions so as to create a scaled image. A first feature of the scaled image i ...


5
Scott M Mansfield, Geng Han, Ioana C Graur: Decomposition with multiple exposures in a process window based OPC flow using tolerance bands. International Business Machines Corporation, H Daniel Schnurmann, March 5, 2013: US08392871 (3 worldwide citation)

Setting final dimensions while protecting against the possibility of merging shapes is provided by performing a decomposition of tolerance bands onto a plurality of masks for use in a multi-exposure process. This allows the maximum process latitude between open and short failure mechanisms, while al ...


6
Ioana C Graur, Ian P Stobert, Dmitry A Vengertsev: Generative learning for realistic and ground rule clean hot spot synthesis. GLOBALFOUNDRIES, Yuanmin Cai, Hoffman Warnick, June 27, 2017: US09690898

Candidate layout patterns can be generated using a generative model trained based on known data, such as historical hot spot data, features extraction, and geometrical primitives. The generative model can be sampled to obtain candidate layouts that can be ranked and repaired using error optimization ...


7
Ronald L Gordon, Ioana C Graur, Lars W Liebmann: Pliant sraf for improved performance and manufacturability. International Business Machines Corporation, Hoffman Warnick & D Alessandro, September 15, 2005: US20050202321-A1

A method for increasing coverage of subresolution assist features (SRAFs) in a layout. A set of possible SRAF placement and sizing rules for a given pitch is provided, ranked according to some figure of merit. During SRAF placement, the fit of a plurality of different SRAF solutions is successively ...


8
Ioana C Graur, Donald J Samuels, Zachary Baum, Lars W Liebmann: Alternating phase shift mask optimization for improved process window. International Business Machines Corporation, International Business Machines Corporation, Dept 18g, February 5, 2009: US20090037866-A1

A method for designing alternating phase shift masks is provided, in which narrow phase shapes located between densely spaced design shapes are colored to allow a maximum amount of light transmission. After assigning and ensuring binary legalization of the phase shapes, the narrow phase shapes are a ...


9
Scott M Mansfield, Geng Han, Ioana C Graur: Decomposition with multiple exposures in a process window based opc flow using tolerance bands. International Business Machines Corporation, November 3, 2011: US20110271238-A1

Setting final dimensions while protecting against the possibility of merging shapes is provided by performing a decomposition of tolerance bands onto a plurality of masks for use in a multi-exposure process. This allows the maximum process latitude between open and short failure mechanisms, while al ...



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