1
Maynard H Olson, John C Chang, Imelda A Muggli: Process for providing polyamide materials with stain resistance with sulfonated novolak resin and polymethacrylic acd. Minnesota Mining and Manufacturing Company, D M Sell, W N Truesdale C Kirn, April 18, 1989: US04822373 (79 worldwide citation)

A treated fibrous polyamide substrate having resistance to staining by acid colorants is provided. The treated substrate comprises a fibrous polyamide substrate having applied thereto (a) a partially sulfonated novolak resin and (b) polymethacrylic acid, copolymers of methacrylic acid, or combinatio ...


2
John C Chang, Maynard H Olson, Imelda A Muggli: Process for providing polyamide materials with stain resistance. Minnesota Mining and Manufacturing Company, Donald M Sell, Walter N Kirn, Carole Truesdale, June 26, 1990: US04937123 (69 worldwide citation)

A method for imparting to fibrous polyamide materials stain resistance to acid colorants is provided. The method comprises contacting the fibrous polyamide materials with an aqueous treating solution comprising polymethacrylic acid, copolymers of methacrylic acid, or combinations thereof, and drying ...


3
Imelda A Muggli, Roger R Alm: Polymerizable fluorochemical surfactants. Minnesota Mining and Manufacturing Company, Gary L Griswold, Walter N Kirn, Robert H Brink, November 21, 1995: US05468812 (7 worldwide citation)

Polymerizable, organic-soluble, oligomeric fluorochemical surfactant compositions having at least two pendent fluoroaliphatic groups, at least two organic-solubilizing groups, and a pendent polymerizable olefinic group. Also a method of preparing such surfactant compositions. The compositions reduce ...


4
Imelda A Muggli: Fluorochemical surfactants and process for preparing same. Minnesota Mining and Manufacturing Company, D M Sell, W N Kirn, C Truesdale, October 10, 1989: US04873020 (6 worldwide citation)

Fluorochemical surfactant compositions are provided. The compositions comprise a fluorochemical amine salt which can be represented by the formula: ##STR1## wherein R.sub.f is a perfluoroaliphatic radical containing 3 to 20 carbon atoms, R is H or CH.sub.3, and R.sup.1 is an alkyl radical containing ...