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Omura Yasuhiro, Ikezawa Hironori, Williamson David M: Projection optical system and method for photolithography and exposure apparatus and method using same. Nikon Corporation, Omura Yasuhiro, Ikezawa Hironori, Williamson David M, HASEGAWA Yoshiki, March 4, 2004: WO/2004/019128 (891 worldwide citation)

Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path befo ...


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Omura Yasuhiro, Ikezawa Hironori, Ishida Kumiko: (Ja) 投影光学系、露光装置、および露光方法, (En) Projection optical system, exposure apparatus, and exposure method. Nikon Corporation, Omura Yasuhiro, Ikezawa Hironori, Ishida Kumiko, YAMAGUCHI Takao, November 11, 2004: WO/2004/097911 (37 worldwide citation)

(EN) An exposure apparatus for high-resolution projection exposure with a high throughput by using an easily producible projection optical system of refraction type and a mask having an ordinal size, disposing a high refractive index medium in the optical path between the projection optical system a ...


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Omura Yasuhiro, Ikezawa Hironori, Shirai Takeshi: Projection optical system, exposure device and exposing method. Nikon, July 22, 2004: JP2004-205698 (26 worldwide citation)

PROBLEM TO BE SOLVED: To provide a projection optical system which can secure a large and substantial image-side numerical aperture by excellently suppressing reflection loss on an optical surface by interposing a medium with a high refractive index in an optical path to an image plane.SOLUTION: The ...


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Ikezawa Hironori, Kudo Yuji, Omura Yasuhiro: (Ja) 投影光学系、露光装置、および露光方法, (En) Projection optical system, exposure system, and exposure method. Nikon Corporation, Ikezawa Hironori, Kudo Yuji, Omura Yasuhiro, YAMAGUCHI Takao, August 3, 2006: WO/2006/080212 (23 worldwide citation)

(EN) An immersion type projection optical system capable of constantly preventing the outflow of immersion liquid into the interior of the optical system and maintaining a good imaging performance, wherein a light path between a light transmitting member (Lp) disposed closest to a second surface (W) ...


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Tanaka Marie, Ikezawa Hironori, Omura Yasuhiro: Projection optical system, exposing device, and exposure method. Nikon, September 22, 2005: JP2005-257740 (23 worldwide citation)

PROBLEM TO BE SOLVED: To provide a relatively small-sized projection optical system applicable to a stitching exposure device, an exposure device, and an exposure method.SOLUTION: The projection optical system for forming a reduction image of a first surface (R) on a second surface (W) satisfies con ...


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Ikezawa Hironori, Omura Yasuhiro: (Ja) 投影光学系、露光装置、および露光方法, (En) Projection optical system, exposure system, and exposure method. Nikon Corporation, Ikezawa Hironori, Omura Yasuhiro, YAMAGUCHI Takao, April 27, 2006: WO/2006/043457 (21 worldwide citation)

(EN) An immersion type projection optical system capable of replacing an immersed parallel flat plate with the laser resistance of a boundary lens kept at a sufficiently high level and without practically causing a decrease in imaging performance. The projection optical system comprises a first ligh ...


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Ikezawa Hironori, Omura Yasuhiro, Nishiyama Michiko: Projection optical system, aligner, and exposure method. Nikon, November 25, 2004: JP2004-335746 (18 worldwide citation)

PROBLEM TO BE SOLVED: To provide a projection optical system which has little aberration and has no degradation in imaging performance when it is used in a liquid-immersed state, and also to provide an exposure apparatus and an exposure method.SOLUTION: The projection aligner which can be used in a ...


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Ikezawa Hironori, Hamaya Masato, Omura Yasuhiro: Projection optical system, aligner, and exposure method. Nikon, January 19, 2006: JP2006-019563 (17 worldwide citation)

PROBLEM TO BE SOLVED: To provide a projection optical system for properly using the combination of the number of openings and an image field.SOLUTION: This projection optical system is configured to reduction-project the image of a first face(R) to a second face(W) so that the maximum number of open ...


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Fujishima Yohei, Omura Yasuhiro, Ikezawa Hironori: Projection optical system, exposure device, and exposure method. Nikon, January 8, 2004: JP2004-004415 (15 worldwide citation)

PROBLEM TO BE SOLVED: To provide a projection optical system which has a sufficiently large numerical aperture and whose chromatic aberration and monochromatic aberration are satisfactorily corrected with respect to ArF excimer laser beams or the like.SOLUTION: The projection optical system includes ...


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Ikezawa Hironori, Omura Yasuhiro, Nakano Katsushi: Projection optical system, aligner, and method of manufacturing device. Nikon, February 1, 2007: JP2007-027438 (15 worldwide citation)

PROBLEM TO BE SOLVED: To provide an immersion projection optical system which is capable of maintaining an excellent image forming performance, even if liquid changes in temperature due to the fact that it is irradiated with light.SOLUTION: The projection optical system projecting an image on a firs ...