1
Akiyoshi Suzki, Ichiro Kano: Photoelectric detecting device. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, February 17, 1981: US04251129 (34 worldwide citation)

A photoelectric detecting device in which a photoelectric detecting system for scanning a surface to be inspected by a light beam and for receiving the light from the inspected surface by a photoelectric detector is partly common to an observation optical system for illuminating the inspected surfac ...


2
Ichiro Kano, Kaoru Mizushiri, Masahiro Ohtake, Hideki Ina, Shinji Utamura, Nobuaki Ogushi, Masaya Ogura, Takashi Sugimori: Information providing method and system. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, December 27, 2005: US06980872 (20 worldwide citation)

An information providing system which includes a reception unit that receives first information concerning a process to be performed by an apparatus from a customer via a network, a processing unit which simulates the process based on the first information and prepares second information based on a ...


3
Akiyoshi Suzuki, Ichiro Kano: Light exposure apparatus for printing. Canon Kabushiki Kaisha, McGlew and Tuttle, October 26, 1976: US03988066 (20 worldwide citation)

In the apparatus, an image of a mask is printed on a light-sensitive layer while minimizing the debasing influences due to the diffraction occurring on the layer surface as well as due to the standing wave occurring in the layer. This apparatus includes an arrangement such that the rays coming from ...


4
Akiyoshi Suzki, Ichiro Kano, Hideki Yoshinari, Masao Tozuka, Ryozo Hiraga, Yuzo Kato, Yasuo Ogino: Photo-electrical detecting apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, April 14, 1981: US04262208 (20 worldwide citation)

This invention relates to a photo-electrical detecting apparatus for forming a dark-field image of an object on a one-dimensional image sensor and reading said image photo-electrically. The apparatus includes a telecentric objective lens, and a light source image is formed on the clear aperture plan ...


5
Akiyoshi Suzuki, Ryozo Hiraga, Ichiro Kano, Hideki Yoshinari, Masao Totsuka, Yuzo Kato, Yasuo Ogino: Alignment apparatus for mask and wafer used in manufacturing semiconductor circuit elements. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, February 9, 1982: US04315201 (19 worldwide citation)

An alignment apparatus for mask and wafer each having alignment marks provided in a narrow strip like area between circuit patterns is disclosed, which mask and wafer are used in manufacturing semiconductor circuit elements. In the apparatus, the mask and wafer are scanned to obtain scan signals by ...


6
Masao Kosugi, Ichiro Kano: Device for adjusting projection magnification. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, June 30, 1987: US04676631 (18 worldwide citation)

A device for adjusting projection magnification of a projection lens usable in a process of manufacture of semiconductor devices to project an image of a pattern of a reticle onto a semiconductor wafer. The device includes at least one plane glass plate to form a substantially closed space at the se ...


7
Akiyoshi Suzki, Ichiro Kano, Hideki Yoshinari, Masao Tozuka, Ryozo Hiraga, Yuzo Kato, Yasuo Ogino: Photoelectric detecting apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, May 13, 1980: US04202627 (17 worldwide citation)

An improved photoelectric detecting apparatus is disclosed in which a subject surface containing a pattern which diffracts light in a predetermined direction is scanned with spotlight and the diffracted light coming from the pattern is detected by means of photoelectric element so as to read out inf ...


8
Tamotsu Karasawa, Ichiro Kano, Hideki Yoshinari: Printing apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, August 5, 1980: US04215934 (13 worldwide citation)

A printing apparatus for use in the manufacture of semiconductor circuit elements, comprising a fixed mirror imaging system. A mask holder and wafer holder are respectively provided in an upper horizontal plane and a lower horizontal plane on the optical axis above and below said mirror imaging syst ...


9
Ichiro Kano, Hideki Yoshinari: Both-side printing device. Canon Kabushiki Kaisha, Toren McGeady and Stanger, April 13, 1976: US03950094 (12 worldwide citation)

A both-side printing device which adjusts the mutual position of patterns to a predetermined relation and prints the patterns on the both sides of a both-side sensitive body of a predetermined thickness, in which the relation of the mutual position of individual patterns to be formed on the both-sid ...


10
Yuzo Kato, Yasuo Ogino, Ryozo Hiraga, Hideki Yoshinari, Masao Tozuka, Ichiro Kano: Alignment apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, June 23, 1981: US04275306 (9 worldwide citation)

An alignment apparatus in which alignment marks on a mask and a wafer for producing a semiconductor circuit element are photoelectrically read and the positional deviation between the two alignment marks is detected and one of the mask and the wafer is parallel-moved in accordance with the detected ...