1
Naoto Sano, Masato Aketagawa, Hitoshi Nakano, Takahisa Shiozawa: Exposure method and apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, June 9, 1992: US05121160 (53 worldwide citation)

An exposure method, includes the steps of directing a radiation beam to a substrate to be exposed; and substantially correcting any change in the size of the radiation beam. Also, there is disclosed an exposure apparatus, which includes a laser for emitting a laser beam; a detector for detecting any ...


2
Hideki Ina, Fumio Sakai, Hitoshi Nakano: Alignment method and a projection exposure apparatus using the same. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, August 28, 1990: US04952060 (37 worldwide citation)

A projection exposure apparatus is disclosed for exposing a semiconductor wafer to a pattern, formed on a reticle, by projection using a projection lens system. The apparatus includes an alignment optical system disposed at a side of the wafer remote from the projection lens system. The alignment op ...


3
Hideki Nogawa, Hitoshi Nakano: Exposure apparatus and device manufacturing method. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, December 16, 2003: US06665046 (33 worldwide citation)

A scan type exposure apparatus for transferring an image of a pattern formed on a mask onto a substrate by synchronously scanning the mask and the substrate in a scanning direction. The apparatus includes a movable stage for holding a substrate thereon, an optical system through which an exposure li ...


4
Katsuhiko Fujii, Hitoshi Nakano, Tetsuro Mitsui: Hydraulic shock absorber for vehicles. Honda Giken Kogyo Kabushiki Kaisha, Irving M Weiner, Pamela S Austin, Melvin Yedlin, September 4, 1979: US04166523 (21 worldwide citation)

A hydraulic shock absorber for vehicles wherein an elastic body tightens the outer periphery of piston rod so that the piston rod floats, and noises and vibrations are reduced to be as low as possible.


5
Hitoshi Nakano: Immersion exposure technique. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, March 25, 2008: US07349064 (19 worldwide citation)

An exposure apparatus having a projection optical system configured to project a pattern of an original to a substrate and exposing a substrate to light via the original with a gap between the substrate and the projection optical system being filled with liquid. The apparatus includes a substrate st ...


6
Hitoshi Nakano: Load-lock chamber and exposure apparatus using the same. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, May 11, 2004: US06734950 (15 worldwide citation)

Disclosed is a load-lock chamber for loading and unloading a reticle or a wafer into and out of an exposure apparatus, which includes a table having a slotted flat plane for carrying thereon one or more reticles or wafers, a combination of an elevation shaft and an elevation driving unit, for moving ...


7
Hitoshi Nakano: Immersion exposure technique. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, July 14, 2009: US07561248 (6 worldwide citation)

An exposure apparatus which has a projection optical system and exposes a substrate to a pattern of an original via the projection optical system with a gap between the projection optical system and the substrate filled with liquid. The apparatus includes a supply nozzle having a supply port to supp ...


8
Kazuo Yamada, Ryutaro Tsuchiya, Senjiro Ishibashi, Hitoshi Nakano, Mitsuhiro Kawai, Kiyoaki Kuzukawa, Kiyoshi Oka, Hiroyuki Miyaura, Yoshikaga Taguchi, Masayoshi Tani: Electromagnetic relay and its manufacture. Omron Corporation, Morrison & Foerster, March 9, 1999: US05880653 (6 worldwide citation)

A manufacturing method for an electromagnetic relay whereby a base block 20 is monolithically molded to terminals 21-24 and connector tabs 62 provided in a lead frame 60. After separating the terminals 21-24 from the lead frame 60 and bending the terminals, a permanent magnet 30 and armature block 4 ...


9
Hitoshi Nakano, Kiyoshi Arakawa: Chemical filter arrangement for a semiconductor manufacturing apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, August 2, 2005: US06924877 (5 worldwide citation)

Disclosed is a semiconductor exposure apparatus which includes a chamber for accommodating therein a main unit of the exposure apparatus, a gas controlling unit for controlling a gas in the chamber, a chemical filter for attracting a chemical substance in a controlling gas, and a dust removing filte ...


10
Hitoshi Nakano: Exposure apparatus, device manufacturing method, gas substituting apparatus, and gas substituting method. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, September 7, 2004: US06788392 (5 worldwide citation)

An exposure apparatus includes a support for holding (i) a pellicle-equipped reticle, the pellicle-equipped reticle including a pellicle frame having an opening, and (ii) a nozzle disposed in an opposed relation to the opening formed in the pellicle frame of the reticle held on the support, the nozz ...