1
Hiroyuki Nagasaka, Takashi Aoki: Exposure method, exposure apparatus, and method for manufacturing device. Nikon Corporation, Oliff & Berridge, August 29, 2006: US07098991 (106 worldwide citation)

According to one embodiment of the invention, a pattern of a mask is transferred onto a substrate via a projection optical system using an energy beam by placing a substrate on side of an energy beam emitting end portion of projection optical system, when the substrate is exposed, and placing an obj ...


2
Hiroyuki Nagasaka: Exposure apparatus, exposure method, and method for producing device. Nikon Corporation, Oliff & Berridge, September 11, 2007: US07268854 (45 worldwide citation)

An exposure apparatus EX exposes a substrate P by projecting an image of a predetermined pattern through a liquid 1 onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism 10 which supplies the liquid onto the subst ...


3
Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hiroyuki Nagasaka: Exposure method, substrate stage, exposure apparatus, and device manufacturing method. Nikon Corporation, Oliff & Berridge, January 27, 2009: US07483119 (42 worldwide citation)

In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substra ...


4
Hiroyuki Nagasaka: Exposure apparatus, exposure method, and method for producing device. Nikon Corporation, Oliff & Berridge, May 19, 2009: US07535550 (36 worldwide citation)

An exposure method exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate by using a projection optical system. The exposure method includes supplying the liquid onto a part of the substrate including a projection area of the projection optical syst ...


5
Hiroyuki Nagasaka, Soichi Owa, Yasugumi Nishii: Exposure apparatus, exposure method, and method for producing device. Nikon Corporation, Oliff & Berridge, June 2, 2009: US07542128 (34 worldwide citation)

An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply mechanism which has a supply flow p ...


6
Hiroyuki Nagasaka, Soichi Owa, Yasugumi Nishii: Exposure apparatus, exposure method, and method for producing device. Nikon Corporation, Oliff & Berridge, November 18, 2008: US07453550 (34 worldwide citation)

An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply mechanism which supplies the liquid ...


7
Yasufumi Nishii, Hiroyuki Nagasaka, Takeshi Okuyama: Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method. Nikon Corporation, Oliff & Berridge, March 13, 2012: US08134685 (28 worldwide citation)

A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the second surface with a first gap inte ...


8
Hiroyuki Nagasaka: Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method. Nikon Corporation, Oliff & Berridge, August 23, 2011: US08004651 (28 worldwide citation)

A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system is provided with a first opening; a gap portion that is provided so that a liquid on an object that opposes the first opening can flow into the gap portion through the first opening; a liquid recovery par ...


9
Hiroyuki Nagasaka: Exposure method, exposure apparatus, and method for producing device. Nikon Corporation, Oliff & Berridge, July 15, 2008: US07399979 (24 worldwide citation)

An exposure system includes an exposure part for irradiating a resist film formed on a substrate with exposing light through a mask with a liquid provided on the resist film. The system also includes a liquid supply part for supplying the liquid to the exposure part. The liquid supply part includes ...


10
Yasufumi Nishii, Hiroyuki Nagasaka, Takeshi Okuyama: Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method. Nikon Corporation, Oliff, April 21, 2015: US09013675 (22 worldwide citation)

A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the second surface with a first gap inte ...