1
Hiroyuki Miyashita, Akira Hirato, Yoshihiro Kawata: Key telephone transmission system. Iwasaki Tsushinki Kabushiki Kaisha, Robert E Burns, Emmanuel J Lobato, Bruce L Adams, April 15, 1986: US04583214 (38 worldwide citation)

A transmission system for a key telephone system, in which speech signals and control signals are transmitted through two pairs of transmission conductors between a key service unit and each of a plurality of key telephone sets, and in which DC electric power is supplied from the key service unit to ...


2
Keiji Hashimoto, Junji Fujikawa, Hiroshi Mohri, Masahiro Takahashi, Hiroyuki Miyashita, Yukio Iimura: Halftone phase shift photomask, halftone phase shift photomask blank, and methods of producing the same. Dai Nippon Printing, Mitsubishi Electric Corporation, Sughrue Mion Zinn Macpeak & Seas, July 23, 1996: US05538816 (29 worldwide citation)

A halftone phase shift photomask designed so that it is possible to shorten the photoengraving process, use a production line for a conventional photomask, prevent lowering of the contract between the transparent and semitransparent regions at a long wavelength in the visible region, which is used f ...


3
Toshifumi Yokoyama, Hiroyuki Miyashita: Phase shift photomask and phase shift photomask dry etching method. Dai Nippon Printing, Sughrue Mion Zinn Macpeak & Seas PLLC, March 3, 1998: US05723234 (20 worldwide citation)

A phase shift photomask capable of being produced by dry etching with adequate in-plane uniformity of pattern dimension even if there is a large difference in exposed area ratio between different areas on the mask. In a phase shift photomask having an area provided with a phase shift layer which pra ...


4
Norihiro Tarumoto, Hiroyuki Miyashita, Yukio Iimura, Koichi Mikami: Phase shift photomask, phase shift photomask blank, and process for fabricating them. Dai Nippon Printing, Sughrue Mion Zinn Macpeak & Seas PLLC, December 30, 1997: US05702847 (18 worldwide citation)

The invention relates to a phase shift photomask in which the peripheral region portion of a phase shift layer is removed by a relatively simple procedure and which has no or little defect and is inexpensive, a blank therefor, and a process for fabricating them. The process includes the steps of for ...


5
Keiji Hashimoto, Junji Fujikawa, Hiroshi Mohri, Masahiro Takahashi, Hiroyuki Miyashita, Yukio Iimura: Blanks for halftone phase shift photomasks, halftone phase shift photomasks, and methods for fabricating them. Dai Nippon Printing, Sughrue Mion Zinn Macpeak & Seas, March 25, 1997: US05614335 (10 worldwide citation)

The invention relates a halftone phase shift photomask and a blank therefor, which enables the transmittance of a phase shift portion to be varied even after blank or photomask fabrication, can accommodate to a variety of patterns, and can be fabricated on a mass scale. The exposure light transmitta ...


6
Hiroyuki Miyashita, Masahiro Takahashi, Hiroshi Mohri: Phase shift photomask comprising a layer of aluminum oxide with magnesium oxide. Dai Nippon Printing, Dellett and Walters, January 10, 1995: US05380608 (9 worldwide citation)

The invention is directed to a phase shift photomask for which a film made of a material capable of providing an etching stopper layer that excels in etching selectivity and can interrupt etching surely and automatically, and provides a phase shift photomask at least comprising a substrate 30 and a ...


7
Hiroyuki Miyashita, Hiroshi Mohri, Masahiro Takahashi, Naoya Hayashi: Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same comprising fluorine in phase shift layer. Dai Nippon Printing, Mitsubishi Electric Corporation, Sughrue Mion Zinn Macpeak & Seas PLLC, April 14, 1998: US05738959 (8 worldwide citation)

A halftone phase shift photomask having a sufficiently high transmittance for light of short wavelength and usable for high-resolution lithography effected by exposure using deep-ultraviolet+radiation, e.g., krypton fluoride excimer laser light. The halftone phase shift photomask has on a transparen ...


8
Hiroyuki Miyashita, Hiroshi Mohri, Masahiro Takahashi, Naoya Hayashi: Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same. Dai Nippon Printing, Mitsubishi Electric Company, Sughrue Mion Zinn Macpeak & Seas PLLC, June 29, 1999: US05916712 (8 worldwide citation)

A halftone phase shift photomask having a sufficiently high transmittance for light of short wavelength and usable for high-resolution lithography effected by exposure using deep-ultraviolet+radiation, e.g., krypton fluoride excimer laser light. The halftone phase shift photomask has on a transparen ...


9
Koichi Mikami, Hiroyuki Miyashita, Yoichi Takahashi, Hiroshi Fujita, Masa aki Kurihara: Phase shift layer-containing photomask, and its production and correction. Dai Nippon Printing, Dellett and Walters, November 18, 1997: US05688617 (7 worldwide citation)

The present invention relates particularly to a process for producing phase shift layer-containing photomasks, which can produce phase shift photomasks through a reduced or limited number of steps to reduce or limit the incidence of phase shifter pattern deficiencies or other defects and at lower co ...


10
Koichi Mikami, Hiroyuki Miyashita, Yoichi Takahashi, Hiroshi Fujita, Masa aki Kurihara: Phase shift layer-containing photomask, and its production and correction. Dai Nippon Printing, Dellett and Walters, March 25, 1997: US05614336 (6 worldwide citation)

The present invention relates particularly to a process for producing phase shift layer-containing photomasks, which can produce phase shift photomasks through a reduced or limited number of steps to reduce or limit the incidence of phase shifter pattern deficiencies or other defects and at lower co ...